Lg Chem, Ltd

Kyung Soo Choi

Dongchang Choi

Geun Young Cha

Sang Chul Lee

Ho Chan Ji

Han Soo Kim

Kwang Han Park

Sunghyun Kim

Dong Chang Choi

Heeyoung Oh

Minjung Kim

Sung Hyun Kim

Sung-Hyun Kim

Min Young Lim

Yoon Hee Heo

Sun Hwa Kim

Ji Heum Yoo

Jung Woo Kim

Guntee Kim

Hae Jung Kim

The present application relates to a negative type photosensitive resin composition including a compound of Chemical Formula 1, an alkali soluble resin binder, a polyfunctional monomer, a colorant, a photoinitiator, and a solvent, and a display apparatus including a black bank formed by using the same.

Resin composition, and display device comprising black bank manufactured by using same

The present invention relates to a photosensitive resin composition and a photosensitive material comprising the same. The photosensitive resin composition according to an exemplary embodiment of the present invention may comprise two multi-functional monomers where structures of side chains comprising unsaturated double bonds are different from each other while a composition ratio is changed. Accordingly, in the exemplary embodiment of the present invention, processability is excellent, and it is possible to decrease defects by a rupture when a LCD substrate is sealed and substrate separation defects due to an impact to the LCD products by improving an adhesion property to a lower substrate after a hard baking process.

Photosensitive resin composition and photosensitive material comprising the same

The present specification relates to a photoresist resin composition, a touch panel including a bezel pattern manufactured by using the photoresist resin composition, and a display device including the bezel pattern manufactured by using the photoresist resin composition.

Photosensitive resin composition and touch panel or display device including bezel pattern prepared by using same

The present specification provides a photosensitive resin composition comprising an alkali-soluble binder, a crosslinkable compound, a photopolymerization initiator, a solvent, a coloring agent and an epoxy adhesion promoter. The photosensitive resin composition has excellent insulating properties and light-shielding properties and shows excellent chemical resistance in an etching process and a stripping process. Thus, the photosensitive resin composition can be formed into a thin bezel layer having a gradual taper, and thus can provide an integrated touch sensor that makes it possible to prevent short circuits from occurring in metal wiring and minimize any decrease in resistance resulting from high-temperature processing.

Photosensitive resin composition, pattern formed using same and display panel comprising same

The present application relates to a fluorine-based resin having a novel structure and a photosensitive resin composition including the same. The photosensitive resin composition including the fluorine-based resin according to an exemplary embodiment of the present application has excellent photosensitivity and developability and can increase a contact angle of a coating film to prevent a water stain. Accordingly, the photosensitive resin composition including the fluorine-based resin according to the exemplary embodiment of the present application may be applied to various photosensitive materials, and particularly, may be preferably applied when a color filter pattern for LCD is manufactured.

Fluorine-based resins and photosensitive resin composition comprising the same

A photosensitive resin composition for a black matrix and a black matrix formed with the same are provided. The photosensitive resin composition for a black matrix includes a solvent consisting of 5-30 weight % of a first solvent having a boiling point of 110-159&#xb0; C., 55-90 weight % of a second solvent having a boiling point of 160-200&#xb0; C., and 3-15 weight % of a third solvent having a boiling point of 201-280&#xb0; C., and the first solvent, the second solvent, and the third solvent are an aliphatic compound and use at least one solvent composition selected from a group consisting of alkyl ester, alkyl ketone, alkyl ether, and alkyl alcohol, and thus a uniform thin film having no surface defect can be obtained, and the photosensitive resin composition has an excellent process property while securing a high light shielding property and thus a black matrix pattern having a few defect can be obtained, and is thus useful for a liquid crystal display.

Photosensitive resin composition for black matrix

Provided is a novel fluorene-based polymer having urethane bonds and a method for preparing the fluorene-based polymer. According to the method, a diol compound is condensed with a diisocyanate instead of an acid dianhydride, and then an acid anhydride is reacted with the reaction mixture to introduce desired acid groups into the final polymer. Further provided is a negative-type photosensitive resin composition comprising of the fluorene-based polymer as a binder resin. The composition exhibits improved chemical resistance, good development margin and high sensitivity due to presence of the acid groups despite the low molecular weight of the fluorene-based polymer.

Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same

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Hanam-si, South Korea

Kyung Soo Choi