Corning Incorporated

Postech Research and Business Development Foundation

Kyung-jin Lee

Byounggwan Kang

Won-bin Hong

Jun Ro Yoon

Seo-Yeong Cho

Young-no Youn

Yoon-seuk Oh

Hyung Rae Kim

A millimeter-wave reflective structure configured to reflect incident millimeter waves includes: a transparent substrate defining unit cells in the form of a matrix, the transparent substrate having an upper surface; and conductive patterns arranged in the unit cells on the transparent substrate, each of the conductive patterns having a hollow rectangular shape.

Millimeter wave (mmW) reflective structure and mmW transmission structure

A method of fabricating a metal thin film-on-glass structure. A glass substrate, on a top surface of which a layer is formed, is prepared. A local area of the glass substrate is etched from a bottom of the glass substrate to expose the layer downwardly, thereby forming an exposed area of the layer. The layer is a metal thin film. The etching includes first-etching the glass substrate to a depth less than a thickness of the glass substrate using a first etching solution containing hydrofluoric acid and at least one of nitric acid and sulfuric acid, resulting in a first-etched portion of the glass substrate; and second-etching the first-etched portion of the glass substrate using an etching solution containing hydrofluoric acid without nitric acid or sulfuric acid, so that the layer is exposed downwardly, whereby the metal thin film is supported by a remaining portion of the glass substrate.

Method of fabricating a metal thin film supported by a glass support

Growing community of inventors

Cheonan-si, South Korea

Kyung-jin Lee