Korea Institute of Machinery & Materials

Kyung-Hyun Whang

Jun-ho Jeong

Eung-Sug Lee

Young-Suk Sim

Young-Jae Shin

HyonKee Sohn

Yeong-Eun Yoo

Sung Hwan Chang

Jung Yup Kim

Doo-Sun Choi

Seung Min Hyun

Jae-Gu Kim

Jae-Sung Yoon

Sung-hwan Chang

Jun-Ho 411-1602 Yeolmae Maeul 858 Jeong

Hyonkee Sohn

Eun-Chae Jeon

Young-Jae 6-102 Gongdongkwanri Apt Shin

Disclosed is an apparatus for self-extracting a cell using a magnetic field. The apparatus for self-extracting the cell using the magnetic field according to the present invention includes a flow path casing including an upper substrate and a lower substrate having a magnetic property combined with each other, and a fluid path formed to fluidize a cell solution therein; a separation portion disposed on the fluid path and provided with a separation channel selectively passing only an effective cell that is a separation target in the cell included in the cell solution therethrough; and a magnetic field control portion forming the magnetic field in the flow path portion to separate the cell blocking the separation channel from the separation channel.

Apparatus for self-extracting cells using magnetic field and method for self-extracting cells using the same

An apparatus for separating cells using magnetic force includes: a separation channel portion including ferromagnetic particles, and provided with a flow path through which a cell fluid containing a plurality of cells having at least one of diamagnetic and paramagnetic properties; and a magnetic field controller that generates a magnetic field within the flow path so that the cells in the cell fluid flow within the flow path and are separated by height by a magnetic field. Accordingly, there are provided an apparatus for separating cells using magnetic force and a cell separation method using the same, by which cells can be easily separated using magnetic force.

Apparatus for separating cells using magnetic force and cell separation method using the same

A UV nanoimprint lithography process and its apparatus that are able to repeatedly fabricates nanostructures on a substrate (wafer, UV-transparent plate) by using a stamp that is as large as or smaller than the substrate in size are provided. The apparatus includes a substrate chuck for mounting the substrate; a stamp made of UV-transparent materials and having more than two element stamps, wherein nanostructures are formed on the surface of each element stamp; a stamp chuck for mounting the stamp; a UV lamp unit for providing UV light to cure resist applied between the element stamps and the substrate; a moving unit for moving the substrate chuck or the stamp chuck to press the resist with the element stamps and substrate; and a pressure supply unit for applying pressurized gas to some selected regions of the substrate to help complete some incompletely filled element stamps.

UV nanoimprint lithography process and apparatus

A microcontact printing method using an imprinted nanostructure is provided, wherein the microcontact printing is introduced to a nanoimprint lithography process to pattern a self-assembled monolayer (SAM). The method includes forming a nanostructure on a substrate by using the nanoimprint lithography process; and patterning the nanostructure with the microcontact printing method. The operation of patterning includes: depositing a metal thin film on the nanostructure; contacting a plate with the nanostructure to selectively print the SAM on the nanostructure, wherein the SAM is inked on the plate and the metal thin film is deposited on the nanostructure; selectively removing the metal thin film by using the SAM as a mask; removing the SAM from the nanostructure; and patterning the substrate by using the remaining metal thin film on the nanostructure as a mask.

Microcontact printing method using imprinted nanostructure and nanostructure thereof

A UV nanoimprint lithography process for forming nanostructures on a substrate. The process includes depositing a resist on a substrate; contacting a stamp having formed thereon nanostructures at areas corresponding to where nanostructures on the substrate are to be formed to an upper surface of the resist, and applying a predetermined pressure to the stamp in a direction toward the substrate, the contacting and applying being performed at room temperature and at low pressure; irradiating ultraviolet rays onto the resist; separating the stamp from the resist; and etching an upper surface of the substrate on which the resist is deposited. The stamp is an elementwise embossed stamp that comprises at least two element stamps, and grooves formed between adjacent element stamps and having a depth that is greater than a depth of the nanostructures formed on the element stamps.

UV nanoimprint lithography process using elementwise embossed stamp and selectively additive pressurization

Growing community of inventors

Daejeon, South Korea

Kyung-Hyun Whang