Samsung Electronics Co., Ltd.

Kyu Youn Hwang

Jae Sung Lee

Jong Myeon Park

Do Gyoon Kim

Jeo Young Shim

Young Seop Seong

Hae Seok Lee

Yeong Bae Yeo

Chin Sung Park

A fluid analysis cartridge having an improved structure in order to increase test reliability, and a fluid analysis apparatus including the same are disclosed. The fluid analysis apparatus comprises: a housing having a fluid supply part for supplying a fluid sample, and a filter member arranged such that the fluid sample supplied to the fluid supply part passes therethrough; a fluid analysis cartridge having a test unit that is connected to the housing so that the fluid sample that has passed through the filter member can be introduced and a test can be performed; and a pressure member that is arranged to pressurize the fluid analysis cartridge in order to move the fluid sample supplied to the fluid supply part to the test unit, wherein the test unit includes a first panel that has a first inflow part facing the filter member, and a second panel that is arranged to face the first panel and that has a second inflow part corresponding to the first inflow part, and the first inflow part may have a smaller width than the second inflow part.

Fluid analysis cartridge, and fluid analysis apparatus including same

A fluid analysis cartridge includes a reference well including a macromolecular coloring reagent having an optical characteristic that varies according to a thickness of the reference well, and a test well including a test reagent having an optical characteristic that varies according to a concentration of a component of a fluid sample that reacts with the test reagent and a thickness of the test well.

Fluid analysis cartridge and fluid analysis apparatus having the same

A method of forming a photoresist pattern, capable of improving an adhesion property of the photoresist pattern formed on a substrate, includes forming a photocatalytic layer on a substrate, forming a negative-type photoresist layer on the photocatalytic layer, exposing the photoresist layer to ultraviolet rays, heat-treating the photoresist layer, and developing the photoresist layer to form the photoresist pattern. Thereby, applying the photocatalytic layer formed on various substrates, the photoresist pattern has excellent adhesion property and is capable of ensuring a high aspect ratio.

Method for forming photoresist pattern

Growing community of inventors

Sejong, South Korea

Kyu Youn Hwang