Samsung Electronics Co., Ltd.

Yonsei University

Kyoungwoo Lee

Seongil Hahm

Jonghoon Shin

Taejun Kwon

WooJin Jang

Jaemyung Choi

Seonghun Lim

Hyunchoong Kim

Nayon Kim

An electronic device and a method for identifying a location by the electronic device are provided. The electronic device includes a display, a processor electrically connected with the display and a memory, and the memory storing instructions executed by the processor. The processor is configured to obtain a plurality of locations in a space-of-interest, detect a wireless signal from at least one external electronic device located in the space-of-interest or an adjacent area, obtain detection frequency data according to a frequency of detection of the wireless signal, and identify a current location of the electronic device based on at least part of the obtained detection frequency data.

Electronic device and method for identifying location by electronic device

A method of forming a metal interconnection of semiconductor device is provided. The method includes forming a low-k dielectric layer including an opening; forming a barrier metal pattern conformally covering a bottom surface and an inner sidewall of the opening; forming a metal pattern exposing a part of the inner sidewall of the barrier metal pattern in the opening; forming a metal capping layer on the top surfaces of the metal pattern and the low-k dielectric layer using a selective chemical vapor deposition process, wherein the thickness of the metal capping layer on the metal pattern is greater than the thickness of the metal capping layer on the low-k dielectric layer; and forming a metal capping pattern covering the top surface of the metal pattern by planarizing the metal capping layer down to the top surface of the low-k dielectric layer.

Semiconductor device having metal interconnections

Growing community of inventors

Seoul, South Korea

Kyoungwoo Lee