Hitachi-high-technologies Corporation

Kyoungmo Yang

Shunsuke Koshihara

Shigeki Sukegawa

Yuichi Abe

Takumichi Sutani

Makoto Nishihara

Junichi Kakuta

Yukari Yamada

Mihoko Kijima

Provided is a method of manufacturing a template matching template, as well as a device for manufacturing a template, by both of which high matching accuracy can be stably ensured without being affected by factors such as process variations. As an embodiment of the above, a method of manufacturing a template matching template, as well as a relevant device, is proposed by both of which a template memorized in advance and an image acquired by a microscope are compared, thereby identifying a desired position, and by which a plurality of images at the identified location are acquired by template matching, and the aforementioned plurality of images are added and averaged, thereby manufacturing a new template.

Method of manufacturing a template matching template, as well as a device for manufacturing a template

In a method and apparatus for quantitatively evaluating two-dimensional patterns, a reference coordinate system is set in order to convert pattern edge information (one-dimensional data) acquired by measurement using an existing critical dimension machine into coordinate data. Thus, a pattern is converted into coordinate information. Next, a function formula is determined from this coordinate information by approximate calculation and a pattern is represented by the mathematical expression y=f(x). Integrating y=f(x) in the reference coordinate used when calculating the coordinate data gives the area of the pattern, whereby it is possible to convert the coordinate data to two-dimensional data.

Method of OPC model building, information-processing apparatus, and method of determining process conditions of semiconductor device

The present invention is a device that creates a template based on design data without performing an exposure simulation, etc., and an object thereof is to provide a pattern matching image forming device capable of forming an image that is commensurate with the size of the actual pattern. As one mode for achieving the object above, there is proposed a pattern matching image forming device that, in forming a matching image, shrinks or enlarges design data based on a desired pattern size, and that forms a matching image based on a pattern thus shrunk or enlarged.

Apparatus for forming image for pattern matching

There is provided a method for setting a suitable imaging magnification for each of a plurality of measurement places in a charged particle beam apparatus which images a semiconductor pattern. For a given measuring point coordinate, a line segment or a vertex representing a change in concavity and convexity near the measuring point coordinate is searched, and an imaging magnification is set so that coordinates on a sample corresponding to both ends which gives a length that serves as a reference falls in a field of view of the charged particle beam apparatus by letting a minimum distance be the reference, of distances between line segments representing a change in concavity and convexity from the measuring point coordinate or a distance between neighboring vertexes.

Method for adjusting imaging magnification and charged particle beam apparatus

To create a template for use in image recognition based on design data, luminance information is set for each area in the template based on the information regarding the region defined by the template. The luminance information may be set based on material information, pattern size information of a pattern arranged in the region defined by the template, and layer information of the region defined by the template. Alternatively, luminance information may be set based on material information, setup conditions of the scanning electron microscope, and pattern outline information of a pattern arranged in the region defined by the template.

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Mito, Japan

Kyoungmo Yang