Lg Electronics Inc.

Samsung Electronics Co., Ltd.

Kyoungmin Choi

Kwanwoong Jeong

Sanghoon Lee

Jihong Woon Lee

Hoon Suk Chang

Dongwoo Kang

Deukwon Lee

Myunggil Kang

Krishna Bhuwalka

Soowon Park

Hoon Chng

A laundry treating apparatus includes a cabinet with an outlet, a drawer drawn out from the outlet, and a tub inside the drawer, providing a space for storing water and having an inlet on its upper surface. A drum rotatably mounted inside the tub includes an inlet on an upper surface for receiving laundry inside of the drum. A cabinet includes a first frame made at least in part from metal and including a first outlet, a second frame made at least in part from metal, spaced apart from the first frame along a moving direction of the drawer, and including a second outlet, a base panel made of a nonmetal lighter than metal, fixed to the first and second frames, and forming a bottom surface of the cabinet, and a metal cover fixed to the first and second frames and forming an upper surface and both sides of the cabinet.

Laundry treating apparatus

The present disclosure relates to a laundry treatment apparatus including a cabinet having an entrance, a drawer comprising a drying chamber, a bottom surface, a front surface extending upward from the bottom surface, a rear surface to face the front surface, and first and second side surfaces to connect the front and rear surfaces. The laundry apparatus includes a first rack disposed in the drying chamber, the first rack comprising a first vent portion allowing a space above and below the first rack to communicate with each other, a second rack disposed in the drying chamber and positioned between the first rack and the bottom surface, the second rack comprising a second vent portion, a supply port formed through the rear surface, an air supply unit located outside the drying chamber, and a guide in the supply port to guide air to at least one of the spaces.

Laundry treatment apparatus

Semiconductor devices are provided. A semiconductor device includes a fin structure having a plurality of first semiconductor patterns and a plurality of second semiconductor patterns alternately stacked on a substrate, and extending in a first direction. The semiconductor device includes a semiconductor cap layer on an upper surface of the fin structure, and extending along opposite side surfaces of the fin structure in a second direction crossing the first direction. The semiconductor device includes a gate electrode on the semiconductor cap layer, and extending in the second direction. The semiconductor device includes a gate insulating film between the semiconductor cap layer and the gate electrode. Moreover, the semiconductor device includes a source/drain region connected to the fin structure. The plurality of first semiconductor patterns include silicon germanium (SiGe) having a germanium (Ge) content in a range of 25% to 35%, and the plurality of second semiconductor patterns include silicon (Si).

Semiconductor devices

A laundry treating apparatus may include a tub, a drum provided within the tub to accommodate laundry, flow path units provided on the drum to provide moving paths of water, an agitation unit provided within the drum so as to be rotatable and moving at least a part of water within the drum to the flow path units during rotation, and filter units to filter water moving along the flow path units. Each of the filter units includes a body configured to provide a storage space of foreign substances, an inflow part to introduce water in the flow path unit into the body, a filter provided on the body to filter water introduced into the body and then to discharge filtered water to the drum, and discharge parts provided on the body to discharge water containing foreign substances in the tangential direction of a rotating trajectory of the drum.

Growing community of inventors

Seoul, South Korea

Kyoungmin Choi