Lg Electronics Inc.

Lg Philips Lcd Co., Inc.

Kyoung-Nam Lim

Jeong-Hyun Kim

Young-Jin Oh

Woong-Kwon Kim

Sung-Il Park

Jae-Yong Park

Jong-Woo Kim

Byeong-Koo Kim

Ki-Hyun Lyu

Soo-Mahn Kim

Byung-Ik Kwon

Mi-Kyung Chu

Kyeong-Ah Shin

Chang-Wook Han

Byung-Chul Ahn

Yong-Min Ha

Dong-Hyo Gu

Hoo-Young Lee

The present invention relates to an identification mark portion and fabricating method thereof, more particularly, to an identification mark portion introduced in a liquid crystal display panel and a fabricating method thereof, which minimizes the error in verifying an ID of a pad by preventing at least two insulating layers from overlapping each other over the upper part of the pad. The present invention includes an insulating substrate, an ID mark pad including an ID mark on the insulating substrate, and a first insulating layer and a second insulating layer on the insulating substrate wherein the first and second insulating layers expose the ID mark in the ID mark pad. In another aspect, the present invention includes the steps of forming an ID mark pad including an ID mark on an insulating substrate, and forming a first and a second insulating layer which expose the ID mark in the ID mark pad.

Identification mark portion in liquid crystal display panel and fabricating method thereof

A method is provided for manufacturing a liquid crystal display having a gate bus line, a data bus line, and a switching element with a drain electrode on a substrate. The method includes the steps of forming a protection layer over the substrate to cover the gate bus line, the data bus line, and the switching element, depositing a first layer on the protection layer, the first layer having a thermal expansion coefficient smaller than that of the protection layer, and depositing a second layer on the first layer, the second layer having a thermal expansion coefficient substantially consistent with that of the first layer. The method further includes the steps of removing portions of the second layer on the first layer to form a desired pattern of the second layer, removing portions of the first layer using the patterned second layer as a mask to form a desired pattern of the first layer, and removing the second layer remaining on the patterned first layer.

Liquid crystal display and method of manufacturing the same

A liquid crystal display includes a substrate; a transistor over the substrate, the transistor having a gate, a source, and a drain; a passivation layer over the transistor; a light shielding layer over a portion of the passivation layer over the transistor; a planarization layer over the light shielding layer and the passivation layer, the planarization layer having a contact hole over one of the source and the drain; a pixel electrode over the planarization layer, the pixel electrode being connected to the one of the source and the drain through the contact hole; and an alignment layer over the pixel electrode.

Liquid crystal display and method for manufacturing the same

An active matrix liquid crystal display (AMLCD) with a high aperture ratio and with an etch stopper formed by a back exposure method, and not with an additional pattern mask. The AMLCD has a gate line that extends in a first direction on the substrate and has a first region that corresponds to the gate electrode region. The gate line also has a second region corresponding to a non-gate electrode region and a contact hole adjacent to the first region and the second region. A thin film transistor (TFT) of the AMLCD is formed with a nonlinear channel region.

Method of making an AMLCD where the etch stopper is formed without first

A thin film transistor substrate for a liquid crystal display includes a substrate; a thin film transistor over the substrate, the thin film transistor having a gate, a source, a drain, a semiconductor layer, and a gate insulation layer; and a protection film over the thin film transistor, the protection film including at least one of fluorinated polyimide, Teflon, cytop, fluoropolyarylether, Fluorinated parylene, PFCB, and BCB.

Liquid crystal display with planarizing organic gate insulator and

A method is provided for manufacturing a liquid crystal display having a gate bus line, a data bus line, and a switching element with a drain electrode over a substrate. The method includes the steps of forming a protection layer over the substrate to cover the gate bus line, the data bus line and the switching element, roughening the surface of the protection layer, removing a portion of the protection layer to define a contact hole in the protection layer over the drain electrode of the switching element, and forming a pixel electrode on the roughened surface of the protection layer, the pixel electrode being connected to the drain electrode through the contact hole.

Method of making LCD having roughened steps of the protection layer

Active matrix liquid crystal display having a contact hole

An active matrix liquid crystal display (AMLCD) and method of manufacture includes gate bus lines and gate electrodes formed on a substrate; a gate insulating layer formed on the substrate, the gate bus lines and the gate electrodes; a semiconductor layer formed on the gate insulating layer; and an ohmic contact layer formed on the semiconductor layer. Also source bus lines, source electrodes, drain electrodes and storage electrodes of storage capacitors are formed on the ohmic contact layer. A first passivation layer covers the storage capacitors, the drain electrodes, the semiconductor layer, the source bus lines and source electrodes; and a second passivation layer covers the first passivation layer and the substrate. Contact holes formed in the first and second passivation layers expose the drain electrodes and the storage capacitors. Pixel electrodes are formed on the storage electrodes, the drain electrodes, the passivation layer, and the substrate.

Active matrix liquid crystal display and method of making

An LCD includes a substrate; a transistor over the substrate, the transistor having a gate, a source, and a drain; a light shielding layer over the transistor; a transparent insulating layer at sides of the light shielding layer, the transparent insulating layer having a substantially consistent thickness; and a pixel electrode connected to one of the source and the drain of the transistor.

Method of fabricating TFT array substrate

TFT array having planarized light shielding element

A liquid crystal display device and method of forming a liquid crystal display device are disclosed. The device having a plurality of pixel electrodes for transmitting light, includes a first panel including an activation region for selectively activating the plurality of pixel electrodes, a first orientation layer formed on the activation region, and a light shielding pattern formed on the first orientation layer; a second panel including a second orientation layer; and a liquid crystal formed between the first and second panels. The device allows proper formation of microgrooves in the entire first orientation layer, for enhancing orientation of liquid crystal molecules, increasing contrast ratio and improving picture quality of the device.

LCD device and method of forming the same in which a black matrix is

A liquid crystal display with in-plane switching mode for improving its light transmittance, includes a first substrate that forms light transmissive portions and light untransmissive portions, a second substrate, and liquid crystal injected between the first and second substrates. The second substrate includes a black matrix, a color filter layer, an overcoat layer and an alignment film. The overcoat layer is patterned to form micro-lenses for refracting the incident light to pass through the light transmissive portions without being blocked by the light untransmissive portions. Various patterning methods can be selected to form the micro-lenses.

Growing community of inventors

Seoul, South Korea

Kyoung-Nam Lim