Canon Kabushiki Kaisha

Kyota Nozu

Yasuhiro Shimada

Kenichi Iwata

Tamaki Kobayashi

Koichiro Nakanishi

Akira Shimazu

Shin Kitamura

Ryoji Kondo

The present invention employs an actuator including: a movable portion connected to a reflecting member having a reflective surface; a movable comb electrode disposed at a distance from the reflecting member, supported by the movable portion, and extended in a direction parallel to the reflective surface; a stationary comb electrode supported by a supporting portion, extends in the direction parallel to the reflective surface, and disposed alternately with the movable comb electrode; and a voltage controller that applies a voltage to the movable comb electrode and the stationary comb electrode to displace the movable comb electrode and the movable portion in a direction normal to the reflective surface. A portion that supports the movable comb electrode and a portion that supports the stationary comb electrode are disposed such that the movable comb electrode and the stationary comb electrode pass each other.

Actuator and movable mirror

A method of forming a pattern with dots or holes arranged in a two-dimensional period by illuminating, with illumination light, a mask having a light-shielding portion pattern on a translucent substrate, and performing projection and exposure of an object to be exposed through a projection optical system. The illumination light is an effective light source of multipole illumination. A first exposure process is performed with the mask placed at a first position relative to the object to be exposed, and a second exposure process is performed with the mask placed at a second position. The mask has line patterns having lines with a line width[m] arranged in parallel at a pitch of P. The line patterns are arranged in a mesh such that the line patterns intersect one another at 60&#xb0; in three directions, and the illumination light is an effective light source of hexapole illumination. The second exposure process is performed, after the first exposure process, with the mask placed at a second position displaced from the first position by 2P/3 [m] in a direction perpendicular to any line of the line patterns. A third exposure process is performed, after the second exposure process, with the mask placed at a third position further displaced from the second position by 2P/3 [m] in the direction, to thereby form a dot pattern in a two-dimensional period having a pitch of P/3 [m].

Pattern forming method

A method for producing an electron-emitting device includes forming a first conductive film on a side surface of an insulation layer including the side surface and a top surface connected to the side surface; forming a second conductive film from the top surface to the side surface and on the first conductive film; and etching the second electrically conductive film.

Method for producing electron-emitting device and method for producing image display apparatus including the same

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Atsugi, Japan

Kyota Nozu