Fuji Electric Co., Ltd.

Kyohei Fukuda

Eiji Mochizuki

Yoshinari Ikeda

Tatsuo Nishizawa

Motohito Hori

Masafumi Horio

Mitsutoshi Sawano

Takaaki Suzawa

Haruo Nakazawa

Yuhei Nishida

Fumio Shigeta

Takahito Harada

A semiconductor device includes semiconductor elements and a multilayer substrate including an insulating plate and a circuit board on which the semiconductor elements are arranged that is arranged on the front surface of the insulating plate. The semiconductor device also includes a printed circuit board that is arranged facing a principal surface of the multilayer substrate and in which through holes are formed, as well as conductive posts that are inserted through the through holes and are electrically connected to the semiconductor elements via bonding materials. Furthermore, the semiconductor device includes fuses that are formed between the interior walls of the through holes and the outer peripheral surfaces of the conductive posts, are electrically connected to the printed circuit board via the conductive posts, and melt at a first temperature.

Semiconductor device

A semiconductor device according to the invention includes an insulating substrate including an insulating plate, a circuit pattern that is formed on a front surface of the insulating plate, and a radiator plate that is fixed to a rear surface of the insulating plate, a semiconductor chip that is fixed to the circuit pattern, an external lead terminal that is connected to a surface electrode of the semiconductor chip through a wiring line, a molding resin that covers the insulating substrate, the semiconductor chip, the wiring line, and the external lead terminal such that a rear surface of the radiator plate and a portion of the external lead terminal are exposed, and an anchor layer including a stripe-shaped concave portion which is formed in the circuit pattern by laser beam irradiation.

It is aimed to reduce the electrical field intensity at a laminate substrate on which a semiconductor device is placed. A semiconductor module includes a laminate substrate including an insulative plate, a circuit board provided on a first surface of the insulative plate and a metal plate provided on a second surface that is opposite to the first surface, and an interconnecting substrate that is provided so as to oppose the laminate substrate and that includes a metal layer. Here, the insulative plate extends more outside than an outer edge portion of the circuit board, and the metal layer has a region overlapping the outer edge portion of the circuit board and extends more outside than the outer edge portion of the circuit board.

Semiconductor module

A semiconductor device includes an insulating substrate having a first conductive pattern on a first insulating substrate; a first semiconductor element having one surface fixed to the first conductive pattern; a printed circuit board having a conductive layer on a second insulating substrate and a plurality of metal pins fixed to the conductive layer; and a third insulating substrate. A portion of pins constituting the metal pins is fixed to other surface of the first semiconductor element, and the printed circuit board with the metal pins is sandwiched between the insulating substrate having the first conductive pattern and the third insulating substrate.

Semiconductor chips are disposed on an insulating substrate with conductive patterns, and a printed circuit board with metal pins is disposed above the insulating substrate with conductive patterns, with the semiconductor chips therebetween. A plurality of external lead terminals is fixed to the insulating substrate with conductive patterns, with the plurality of external lead terminals disposed adjacent to each other in parallel. Furthermore, metal foil pieces formed on front and rear surfaces of the printed circuit board with metal pins respectively so as to face each other, are disposed above the semiconductor chips.

A semiconductor device and manufacturing method are disclosed which prevent breakage and chipping of a semiconductor chip and improve device characteristics. A separation layer is in a side surface of an element end portion of the chip. An eave portion is formed by a depressed portion in the element end portion. A collector layer on the rear surface of the chip extends to a side wall and bottom surface of the depressed portion, and is connected to the separation layer. A collector electrode is over the whole surface of the collector layer, and is on the side wall of the depressed portion. The thickness of an outermost electrode film is 0.05 &#x3bc;m or less. The collector electrode on the rear surface of the chip is joined onto an insulating substrate via a solder layer, which covers the collector electrode on a flat portion of the rear surface of the semiconductor chip.

Semiconductor device manufacturing method

Aspects of the invention provide an internal wiring structure of a power semiconductor device, which is capable of reducing a mutual inductance between two wiring conductors and improving the heat dissipation effect, the two wiring conductors being disposed so as to oppose each other and having currents flowing in the same direction. In some aspects, notches can be formed alternately from side walls of two flat plates, on the flat plates, to obtain two wiring conductors. The two wiring conductors can be disposed so as to oppose each other and in parallel to each other so that currents flow along the notches in directions opposite to each other. Accordingly, in some circumstances, the mutual inductance can be reduced. Further, in some circumstances, the dimensions of the planes of the wiring conductors obtained by forming the notches can be increased to improve the heat dissipation.

Internal wiring structure of semiconductor device

A semiconductor device, and method of manufacturing the device, having a p type diffusion layer; a V-groove including a bottom surface parallel to the rear surface and exposing the p type diffusion layer and a tapered side surface rising from the bottom surface; a p type semiconductor layer on the rear surface surrounded by the tapered side surface of the V-groove; and a p type isolation layer formed on the side surface and electrically connecting the p type diffusion layer on the front surface and the p type semiconductor layer on the rear surface. The V-groove has a chamfered configuration around the intersection between a corner part of the side surface and the bottom surface of the V-groove. An object is to prevent performance degradation due to stress concentration at the corner part of a recessed part caused by thermal history in soldering.

Growing community of inventors

Matsumoto, Japan

Kyohei Fukuda