Kyzen Corporation

Kyle J Doyel

Michael L Bixenman

Scotty S Sengsavang

Valerie G Porter

Kristie L Gholson

Patricia D Overstreet

Arthur J Thompson

Chemical solvating, degreasing, stripping and cleaning agents. The agents are cleaning and solvating mixtures of dichloroethylene and alkoxy-substituted perfluoro compounds that contain six carbon atoms, with optionally highly fluorinated materials to retard flammability and/or other enhancement agents that improve and enhance the properties of the composition to accomplish its desired cleaning or solvating task. These other agents are one or more of the following materials: alcohols, esters, ethers, cyclic ethers, ketones, alkanes, aromatics, amines, siloxanes terpenes, dibasic esters, glycol ethers, pyrollidones, or low- or non-ozone depleting halogenated hydrocarbons. These mixtures are useful in a variety of solvating, vapor degreasing, photoresist stripping, adhesive removal, aerosol, cold cleaning, and solvent cleaning applications including defluxing, dry-cleaning, degreasing, particle removal, metal and textile cleaning.

Cleaning compositions containing dichloroethylene and six carbon alkoxy substituted perfluoro compounds

Chemical solvating, degreasing, stripping and cleaning agents. The agents are cleaning and solvating mixtures of mono brominated compounds with highly fluorinated compounds and/or other agents that improve and enhance the properties of the original mixture. The addition of these agents to the composition will modify the physical and/or cleaning characteristics of the monobrominated compound and/or monobrominated compound-fluorinated compound mixture to accomplish is desired cleaning or solvating task. These other agents are one or more of the following materials: alcohols, esters, ethers, cyclic ethers, ketones, alkanes, terpenes, dibasic esters, glycol ethers, pyrollidones, or low or non ozone depleting chlorinated and chlorinated/fluorinated hydrocarbons. These mixtures are useful in a variety of solvating, vapor degreasing, photoresist stripping, adhesive removal, aerosol, cold cleaning, and solvent cleaning applications including defluxing, drycleaning, degreasing, particle removal, metal and textile cleaning.

Low ozone depleting brominated compound mixtures for use in solvent and cleaning applications

Compositions and methods for cleaning, degreasing, stripping, solvating and/or removing residues and contaminants such as oils, grease, dirt, flux, inks, coatings, photoresists, resins and polymers from manufactured articles and hard surfaces such as, but not limited to metals, plastics, textiles, electronic devices, silicon wafers, mechanical devices or manufacturing equipment. The compositions contain at least one 4 carbon cyclic ether solvent mixtures with at least one 3-alkoxy 3-methyl butanol, as well as other optional alkaline materials as well as other optional solvents and additives. The compositions can be contacted with a surface to be cleaned in a number of ways and under a number of conditions depending on the manufacturing or processing variables present.

Cleaning compositions and methods for cleaning using cyclic ethers and

Compositions and methods for cleaning, solvating, and/or removing plastic resins and polymers or other contaminants from manufactured articles or manufacturing equipment, particularly in the production of optical lenses. The compositions contain at least one nitrogen containing compound as well as other optional solvents and additives. The compositions can be contacted with a surface to be cleaned in a number of ways and under a number of conditions depending on the manufacturing or processing variables present.

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Nashville, TN, United States of America

Kyle J Doyel