Basf Se Corporation

Wayne State University

Other

Kyle Blakeney

Charles H Winter

Sabine Weiguny

David Dominique Schweinfurth

Lukas Mayr

Sinja Verena Klenk

Nilanka Weerathunga Sirikkathuge

Tharindu Malawara Arachchige Nimanthaka Karunaratne

Daniel Waldmann

Charles Hartger Winter

A process including bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous state where A is NRor OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group,E is NR or O,n is 0, 1 or 2, m is 0, 1 or 2, andR' is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group.

Process for the generation of metal-containing films

Described herein is a process for preparing inorganic metal-containing films including bringing a solid substrate in contact with a compound of general formula (I) or (II) in the gaseous state 

The present disclosure is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. Described herein is a process for preparing metal-containing films including: 

Aluminum precursor and process for the generation of metal-containing films

A process including bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous state where A is NRor OR with R being an alkyl group, an alkenyl group, an aryl group, or a silyl group,E is NR or O,n isor, m isor, andR' is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group.

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Detroit, MI, United States of America

Kyle Blakeney