Lg Display Co., Ltd.

Lg Philips Lcd Co., Inc.

Kwon-Shik Park

Min-Cheol Kim

Youn-Gyoung Chang

So-Hyung Lee

Myoung-Kee Baek

Ho-Young Jung

Jeong-Suk Yang

Ha-Jin Yoo

Jae-Won Lee

Min-Joo Kim

Hyangmyoung Gwon

Jae-Young Oh

BuYeol Lee

Seung-Hee Nam

Eun-Hye Lee

Deuk-Su Lee

Bu-Yeol Lee

SeungHee Nam

Yangsik Lee

Tae-Hwan Kim

Deuksu Lee

DeukSu Lee

SuChang An

Soon-Sung Yoo

Heung-Lyul Cho

Seoyeon Im

HeeSung Lee

SungKi Kim

Young-Gyoung Chang

Buyeol Lee

Disclosed is an organic light emitting display having reduced thickness and weight. The organic light emitting display with a touch sensor removes the necessity of an additional adhesion process by directly forming a touch sensor including a touch sensing line and a touch driving line and a color filter on the encapsulation layer covering a light emitting device, thereby simplifying a manufacturing process and reducing manufacturing costs.

Display device with touch sensor

An organic light-emitting display panel having a built-in touchscreen includes a plurality of subpixels defined therein by a plurality of data lines and a plurality of gate lines, an encapsulation layer having an encapsulating function, and a color filter layer located on the encapsulation layer. An organic light-emitting display device includes the organic light-emitting display panel. Both the organic light-emitting display panel having a built-in touchscreen and the organic light-emitting display device having a built-in touchscreen is provided with a structure enabling a touchscreen disposed therewithin.

Organic light-emitting display panel and organic light-emitting display device having built-in touchscreen

Disclosed are an organic light emitting display device and a method of manufacturing the same to reduce thickness and weight. The organic light emitting display device with a touch sensor removes the necessity of an additional adhesion process by directly forming a touch sensing electrode and a touch driving electrode arranged in parallel and a color filter on an encapsulation layer covering a light emitting device, thereby simplifying a manufacturing process and reducing manufacturing costs.

A display device includes a gate electrode on a substrate of a semiconductor device, a gate insulating film over the gate electrode, an active layer comprising an oxide including indium, zinc and gallium on the gate insulating film, and overlapping the gate electrode, and a source electrode and a drain electrode that are spaced apart from each other, wherein the active layer is formed from a zinc-rich target material, and an atomic % ratio of indium, zinc and gallium in the active layer is different from an atomic % ratio of the zinc-rich target material.

Crystallization method for oxide semiconductor layer, semiconductor device manufactured using the same, and method for manufacturing the semiconductor device

An organic light-emitting display panel having a built-in touchscreen and an organic light-emitting display device having a built-in touchscreen is disclosed. The organic light-emitting display panel includes a plurality of subpixels defined therein by a plurality of data lines and a plurality of gate lines, an encapsulation layer having an encapsulating function, and a color filter layer located on the encapsulation layer. The organic light-emitting display device includes the organic light-emitting display panel. Both the organic light-emitting display panel having a built-in touchscreen and the organic light-emitting display device having a built-in touchscreen is provided with a structure enabling a touchscreen disposed therewithin.

The present disclosure relates to a thin-film transistor including two-dimensional semiconductor and display apparatus including the same. The thin-film transistor includes a gate electrode disposed on a substrate, a semiconductor layer disposed so as to overlap at least a portion of the gate electrode in the state of being isolated from the gate electrode, a gate insulation film disposed between the gate electrode and the semiconductor layer, a source electrode connected to the semiconductor layer, and a drain electrode connected to the semiconductor layer in the state of being spaced apart from the source electrode, wherein the semiconductor layer includes a first layer including an oxide semiconductor and a second layer disposed so as to overlap the first layer in a plane view, the second layer comprising a two-dimensional semiconductor, and an energy band gap of the first layer is larger than an energy band gap of the second layer.

Thin-film transistor including two-dimensional semiconductor and display apparatus including the same

A method for manufacturing a semiconductor device is discussed. The method includes forming a gate electrode on a substrate, forming a gate insulating film over the substrate, depositing an In&#x2014;Ga&#x2014;Zn oxide over the gate insulating film while heating the substrate to a temperature of 200 to 300&#xb0; C., an atomic percent ratio of Zn in the In&#x2014;Ga&#x2014;Zn oxide as-deposited being higher than that of In or Ga, heat-treating the deposited In&#x2014;Ga&#x2014;Zn oxide at a temperature of 200 to 350&#xb0; C., thereby forming an active layer crystallized throughout an entire thickness of the active layer, and forming a source electrode and a drain electrode.

An oxide semiconductor crystallization method may include depositing an In&#x2014;Ga&#x2014;Zn oxide over the substrate while heating a substrate to a temperature of 200 to 300&#xb0; C., and heat-treating the deposited In&#x2014;Ga&#x2014;Zn oxide at a temperature of 200 to 350&#xb0; C., thereby forming an oxide semiconductor layer crystallized throughout an entire thickness thereof.

A method for manufacturing a thin film transistor (TFT) array substrate having enhanced reliability is disclosed. The method includes forming a multilayer structure including at least one first metal layer and a second metal layer made of copper, forming a first mask layer including a first mask area corresponding to a data line and a second mask area corresponding to an electrode pattern to overlap with an active layer, patterning the multilayer structure, thereby forming the data line constituted by the multilayer structure, patterning the second metal layer, thereby forming the electrode pattern constituted by the at least one first metal layer, forming a second mask layer to expose a portion of the electrode pattern corresponding to a channel area of the active layer, patterning the at least one first metal layer, thereby forming source and drain.

Method for manufacturing thin film transistor array substrate

A fabrication method of a liquid crystal display device uses a printing method which forms a pattern of a wider effective line width such as a gate line, a data line, a passivation layer, a pixel electrode, etc. constituting an LCD device. The inventive lithography process uses a mask that is applied at the time of forming a channel region having a narrow effective line width. Accordingly, the amount of resist used may be reduced, and the fabrication process can be simplified. This printing method can be used to fabricate a color filter substrate of an LCD device.

Fabrication method of a liquid crystal display device using a printing method

A method for forming a pattern of a liquid crystal display (LCD) device includes providing a clich&#xe9; having at least a first groove structure having a first width and a second groove structure having a second width equal to at least a multiple of the first width and an interval, filling a resist material into the first and second groove structures of the clich&#xe9;, and applying the resist material filled into the first and second groove structures of the clich&#xe9; onto an etching object layer of a substrate.

Method for forming pattern of liquid crystal display device

A method of fabricating a liquid crystal display device includes providing a clich&#xe9; having a plurality of grooves, each of the grooves having different depths and widths, filling resist material into the plurality of grooves, transferring the resist filled in the grooves onto a printing roll to form a plurality of resist portions along a circumference of the printing roll, and applying the resist portions onto a surface of an etching layer, wherein the applied resist portions form a resist pattern along the surface of the etching layer.

Method for fabricating liquid crystal display device

A method for forming a pattern using a printing process is disclosed in the present invention. The method includes forming a resist layer on a substrate having an etching layer thereon, locating a master having a convex pattern over the substrate, pressing the master against the substrate until the convex pattern of the master directly contacts the etching layer, and removing a portion of the resist layer to expose a surface over the substrate, the removed portion of the resist layer having a width substantially the same as the convex portion of the master.

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Seoul, South Korea

Kwon-Shik Park