Samsung Display Co., Ltd.

Lg Electronics Inc.

Skhynix Inc.

Seoul National University

Amazon Technologies, Inc.

Stc, Inc

Toptec Company Limited

Kwangho Lee

Deog-Kyoon Jeong

Jinhyouk Shin

Jangwoo Lee

Joonggun Chong

Jeonggyu Kim

Junggeun Oh

YongHwan Shin

Jae-Jin Lyu

Sanghee Lee

Youngbae Kim

Kyungho Jung

Sangil Kim

Jinbo Shim

Jongseong Kim

Jinhyung Lee

Moonkap Lee

Jaeyoung Sim

Myunghwan Park

Choisang Park

Hyeokyun Kwon

A M Tchebotar

E P Dontsova

V V Abramov

V I Nikolaichik

Sungsam Joe

S N Degtiareva

Moon-Chul Choi

Seungha Roh

A receiver includes a sampling circuit configured to sample a comparison result between an input signal and a plurality of threshold voltages according to a sampling clock signal; a clock controller configured to generate the sampling clock signal according to a clock control signal; and a control circuit configure to generate the clock control signal and the plurality of threshold voltages according to a target value and an output of the sampling circuit. The control circuit operates to control a ratio of a magnitude of a main cursor of the input signal and a magnitude of a pre-cursor intersymbol interference to be the target value.

Receiver for removing intersymbol interference

A receiver includes an equalization circuit configured to output a data sample signal and an edge sample signal by sampling a data input signal according to clock signal, and to perform an equalization operation according to the data sample signal and the edge sample signal; and a clock gate circuit configured to select the clock signals from among a plurality of multi-phase clock signals according to a selection signal.

Receiver including a multi-rate equalizer

A display device includes a substrate having a first area, a second area, and a bending area between the first area and the second area. A display element is disposed in the first area of the substrate. A stress neutralizing layer is disposed in the first area, the second area and the bending area. A thickness of the stress neutralizing layer in the bending area is less than a thickness of the stress neutralizing layer in at least one of the first area or the second area.

Display device including a stress neutralizing layer

A display substrate includes a base substrate, a gate electrode, a semiconductor layer, a source electrode, a drain electrode, a first black organic layer, a data line and a pixel electrode. The gate electrode is disposed on the base substrate. The semiconductor layer is disposed on the gate electrode. The source electrode is disposed on the semiconductor layer. The drain electrode is disposed on the semiconductor layer and is spaced apart from the source electrode. The first black organic layer is disposed on the source electrode and the drain electrode. The data line is disposed on the first black organic layer, and is electrically connected to the source electrode through a contact hole formed through the first black organic layer. The pixel electrode is electrically connected to the drain electrode. Thus, display quality of a display apparatus including the display substrate may be improved.

Display substrate

A display substrate includes a base substrate, a gate metal pattern, a semiconductor layer, and a data metal pattern. The base substrate includes a display area and a peripheral area. The gate metal pattern includes a gate electrode of a transistor and includes a gate metal member disposed on the peripheral area. The transistor is disposed on the display area. The semiconductor layer includes a channel portion of the transistor and includes a semiconductor member disposed on the peripheral area. The data metal pattern includes a source electrode of the transistor and includes a data metal member disposed on the peripheral area, electrically connected to the gate metal member, and directly contacting the semiconductor member. A maximum thickness of the data metal member in a direction perpendicular to the base substrate is greater than a maximum thickness of the semiconductor member in the direction.

Substrate structure and method of manufacturing substrate structure

There is disclosed a plasma enhanced chemical vapor deposition apparatus including a chamber in which plasma reaction is performed to provide a functional film to an object received therein, a pallet mechanically and electrically connected with the object, a conveyer to convey the pallet to an inside from an outside of the chamber, and a power supplier to supply an electric power to the pallet, the power supplier comprising a moving contact distant from the pallet when the pallet is conveyed and contacting with the pallet when the pallet is stopped.

Plasma enhanced chemical vapor deposition apparatus and method for controlling the same

An apparatus that couples a first substrate and a second substrate of an electrowetting display panel, the apparatus comprising a first chuck provided with a first support surface and a second chuck provided with a second support surface opposite to the first support surface and positioned beneath the first chuck. The second support surface is smaller than the first support surface and is positioned in a plane parallel to a plane that includes the first support surface.

Apparatus of coupling substrates for electrowetting display panel and method of coupling substrates for electrowetting display using the same

A substrate peeling apparatus includes a support member and absorption pads. The support member, having a quadrangular shape, includes first and second vertexes diagonally facing each other in a first direction, and third and fourth vertexes diagonally facing each other in a second direction crossing the first direction. The absorption pads is disposed on the support member. The absorption pads are arranged in rows in a direction parallel to the first direction and at least one absorption pad of each row is arranged in a direction parallel to the second direction. An absorption pad of each row includes a hole having an increasing internal diameter as a distance in the first direction between the each row and the first vertex increases. An internal diameter of an absorption pad in a row positioned halfway between the first and second vertexes has a maximum internal diameter.

Substrate peeling apparatus and method of peeling substrate using the same

There is disclosed a plasma enhanced chemical vapor deposition apparatus including a loading station to load an object on a pallet, an operation station to form a functional film by performing plasma reaction to the object loaded on the pallet, a unloading station to separate the object from the pallet, a circulation station to convey the pallet from the unloading station to the loading station, and a conveyer to convey the pallet to the stations sequentially to circulate the pallet.

A polyolefin composition which is photolyzable, includes polyolefin; and an effective amount of a photolytic agent which is an alkoxydimethylsilylferrocene having a general formula (I): ##STR1## wherein R represents C.sub.n H.sub.2n+1 in which n ranges from 4 to 10, and R.sub.1 and R.sub.2 represent H or SICH.sub.3).sub.2 OR and may be the same or different. The polyolefin is preferably selected from the group consisting essentially of a low density polyethylene, a high density polyethylene, a polypropylene, an ethylene-propylene copolymer, an ethylene-butene copolymer, an ethylene-hexene copolymer, an ethylene-octene copolymer, an ethylene-vinyl acetate copolymer, and mixtures thereof. The alkoxydimethylsilylferrocene is preferably present in an amount ranging from 0.001 weight % to 0.5 weight %, most preferably, in an amount ranging from 0.005 weight % to 0.2% weight %.

Photolyzable polyolefin composition

Growing community of inventors

Seoul, South Korea

Kwangho Lee