Samsung Electronics Co., Ltd.

Industry-University Cooperation Foundation Hanyang University

Hannam University Institute-Academia Corporation

Kwang-sup Lee

Jong-jin Park

Xavier Bulliard

Kwang-hee Lee

Yun-hyuk Choi

Jea Gun Park

Tae-Dong Kim

Won-jae Joo

Heong Sub Oh

A photosensitive quantum dot including a quantum dot, and a plurality of photosensitive moieties that are bound to a surface of the quantum dot, wherein each of the photosensitive moieties includes silicon (Si) and a photosensitive functional group. Also disclosed are a composition for forming a quantum dot-containing pattern, where the composition includes the photosensitive quantum dot, and a method of forming a quantum dot-containing pattern using the composition.

Photosensitive quantum dot, composition comprising the same and method of forming quantum dot-containing pattern using the composition

Disclosed are a benzobis(thiadiazole)-based alternating copolymer, a method for preparing the same, and an organic electronic device including the same. The present disclosure provides a benzobis(thiadiazole)-based alternating copolymer represented by the chemical formula 1: 

Benzobis(thiadiazole)-based alternating copolymer and preparation thereof

A composition for radical polymerization includes a photosensitive material, a photoinitiator, a solvent, and a material for adjusting a size of a pattern. A method of forming a pattern using the composition is also disclosed.

Composition for radical polymerization and method of forming pattern using the composition

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Daejeon, South Korea

Kwang-sup Lee