Semes Co., Ltd.

Kwang Sup Kim

Jong Min Lee

Young Ho Park

Ji Hoon Yoo

Jun Ho Oh

Yeon Chul Song

Myeong Jun Lim

Ji Hoon Jeong

Sang Hyun Son

Pil Kyun Heo

Hyun Yoon

Young Dae Chung

Do Yeon Kim

Kuk Saeng Kim

Tae Shin Kim

Jung Suk Goh

Jee Young Lee

Young Je Um

Won Geun Kim

Sang Min Ha

Dong Ok Ahn

Ye Rim Yeon

Jae Hong Kim

Yong Jun Seo

Do Youn Lim

Jae Seong Lee

Byeong Geun Kim

Yoon Ki Sa

Kyung Hun Jang

Joong Chol Shin

The inventive concept provides a teaching method for teaching a transfer position of a transfer robot. The teaching method includes: searching for an object on which a target object to be transferred by the transfer robot is placed, based on a 3D position information acquired by a first sensor; and acquiring coordinates of a second direction and coordinates of a third direction of the object based on a data acquired from a second sensor which is a different type from the first sensor.

Teaching method, program stored in the medium for executing the teaching method and transfer system

Provided are a substrate inspecting unit capable of reducing image data labeling work time through training image data set verification and semi-automatic image labeling, and at the same time, improving prediction performance by improving classification accuracy for data sets, and a substrate treating apparatus including the same. The substrate inspecting unit comprises a feature extracting module for extracting a feature from training data included in each class in response to a plurality of training data related to image data of a substrate being classified according to a predefined class, a validity evaluating module for evaluating validity of the feature, a class verifying module for verifying the predefined class, and a data reconstructing module for reconstructing the plurality of training data based on a feature determined as valid and a verified class, wherein reconstructed training data is utilized when inspecting the substrate.

Substrate inspecting unit and substrate treating apparatus including the same

A static electricity visualization system capable of visually confirming the level of the measured static electricity is provided. The static electricity visualization system comprises a first measuring unit for measuring a static electricity level detected at a first position of a measurement target and comprising a first mark, a photographing unit for generating a photographed image by photographing the measurement target, a processor for recognizing a first mark in the photographed image and calculating coordinates of the first mark on the photographed image, and an output unit for outputting a static electricity visualization image that visualizes the static electricity level measured by the first measuring unit in a first mode, wherein the static electricity visualization image comprises a color corresponding to a level of static electricity measured by the first measuring unit on the coordinates of the first mark of the photographed image.

Static electricity visualization system

Provided are a control unit that predicts the life of an inkjet head unit and maximizes its life to be used, and a substrate treating apparatus including the same. The control unit performs maintenance of an inkjet head unit for discharging a substrate treatment liquid onto a substrate and comprises a count module for counting the number of discharges for each nozzle of the inkjet head unit, a comparison module for comparing the number of discharges with a reference value to determine whether the number of discharges is equal to or greater than the reference value, and an evaluation module for evaluating whether a life of the inkjet head unit has reached a usable life based on whether the number of discharges of each nozzle is equal to or greater than the reference value.

Control unit and substrate treating apparatus including the same

A static electricity visualization apparatus capable of visually identifying a measured level of static electricity is provided. The static electricity visualization apparatus comprises a photographing unit for generating a first photographed image obtained by photographing a measurement target at a first distance from the measurement target in a first mode, and generating a second photographed image obtained by photographing the measurement target at a second distance from the measurement target in a second mode, a static electricity sensor for measuring a static electricity level of the measurement target at the second distance from the measurement target, a processor for matching the second photographed image with the first photographed image, and an output unit for outputting a static electricity visualization image that visualizes a static electricity level measured by the static electricity sensor on the first photographed image, wherein the static electricity visualization image comprises a color corresponding to the static electricity level of the measurement target measured by the static electricity sensor at a position where the second photographed image matches on the first photographed image.

Static electricity visualization device

Disclosed are an apparatus and a method for quickly and accurately inspecting a droplet on a substrate. An apparatus for inspecting a droplet on a substrate according to an exemplary embodiment of the present disclosure includes: an ultrasonic sensor configured to apply an ultrasonic wave to a droplet on the substrate and detect an ultrasonic wave reflected from the substrate; and a processor configured to acquire a height of the droplet at each position on the substrate on the basis of a signal of the ultrasonic wave reflected from the droplet on the substrate, calculate a volume of the droplet on the basis of the heights of the droplet at the positions, and store or output data in relation to the volume of the droplet. The embodiment of the present disclosure may calculate the volume of the droplet using the ultrasonic wave, thereby quickly and accurately inspecting the droplet on the substrate.

Apparatus and method for inspecting droplet

Method and apparatus for etching a thin layer including silicon nitride formed on a substrate are disclosed. Etchant including phosphoric acid and water is supplied on the substrate so that a liquid layer is formed on the substrate. The thin layer is etched by reaction between the thin layer and the etchant. Thickness of the liquid layer is measured to detect variation in the thickness of the liquid layer while etching the thin layer. Variation in the concentration of the phosphoric acid and the water is calculated based on the variation in the thickness of the liquid layer. Water is supplied on the substrate based on the variation in the concentration of the phosphoric acid and the water so that the concentration of the phosphoric acid and the water becomes a predetermined value.

Method and apparatus for etching thin layer

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Asan-si, South Korea

Kwang Sup Kim