Sk Innovation Co., Ltd.

Sk-Materials Co., Ltd.

Korea Advanced Institute of Science and Technology

Sk Corporation

Sk Global Chemical Co., Ltd.

Kwang Kuk Lee

Cheol Woo Kim

Jin Su Ham

Jin Sung Kim

Sun Young Kim

Young Bom Kim

Jin Kyung Jo

Seong Il Lee

Nam Kyu Lee

Yu Na Shim

Hyo Seung Park

Jae Hoon Kwak

Jong Ho Lee

Jong Chan Kim

Han Sol Lee

Yeon Sik Jung

Jong Ho Lim

Yoon Hyung Hur

Seung Yon Oh

Jung Ha Shin

Seung Won Song

Dai In Park

Sung Yon Oh

Sun Joo Kim

Min Ho Jung

Whee Sung Kim

Hye Ryoung Lee

An etching composition includes phosphoric acid, a silane compound comprising at least one silicon (Si) atom, and an organic phosphate represented by Formula 1 below:

Etching composition, method for etching insulating film of semiconductor devices using the same and method for preparing semiconductor devices

Provided are a random copolymer for forming a neutral layer promoting directed self-assembly pattern formation, a laminate for forming a pattern including the same, and a method for forming a high-quality pattern using the same.

Random copolymer, laminate, and method for forming pattern

The present invention provides a random copolymer including structural units represented by the following Chemical Formulae 1 to 3 for forming a neutral layer for significantly reducing process time and process costs, and promoting directed self-assembly pattern formation of a block copolymer. The present invention further provides a laminate for forming a pattern including a neutral layer having a small thickness variation value due to washing, by including the random copolymer for forming a neutral layer. The present invention further provides a method for forming a pattern capable of stably vertically orienting a block copolymer on a laminate for forming a neutralized pattern.

Random copolymer for forming neutral layer, laminate for forming pattern including the same, and method for forming pattern using the same

An etchant composition includes a silane compound represented by the following Chemical Formula 1: 

Silane compound

An etching composition includes phosphoric acid, a silane compound comprising at least one silicon (Si) atom, and an ammonium salt represented by Formula 1 below: 

An etching composition is provided. The etching composition includes phosphoric acid, phosphoric anhydride, a silane compound represented by Formula 1 below and water: 

Etching composition, method for etching insulating layer of semiconductor devices and method for preparing semiconductor devices

Etchant composition, method of etching insulating film, method of manufacturing semiconductor device, and silane compound

Provided is a method of preparing poly(alkylene carbonate) using a molecular weight regulator in a process of preparing a copolymer of carbon dioxide/epoxide using a novel complex synthesized from salen-type ligand including a quaternary ammonium salt as a catalyst. According to the present invention, even though the molecular weight regulator is used, an activity of the catalyst may be stably maintained, whereby the low molecular weight of poly(alkylene carbonate) having a desirable level may be effectively provided. In addition, it is expected that since the novel complex as the catalyst of the present invention has a simple structure as compared to the existing copolymerization catalyst, due to the economical preparation cost thereof, the novel complex may be effectively applied to a large-scale commercial process.

Method of preparing poly(alkylene carbonate) via copolymerization of carbon dioxide/epoxide in the presence of novel complex

Provided are an electrolyte for a lithium secondary battery and a lithium secondary battery including the same, wherein the electrolyte for a lithium secondary battery of the present invention may improve DC-IR characteristic and battery storage characteristic, and may improve high-temperature stability, low-temperature characteristic, and lifespan characteristic to thereby be effectively used for manufacturing a secondary battery.

Electrolyte for lithium secondary battery and lithium secondary battery including the same

Provided are a lithium secondary battery electrolyte and a lithium secondary battery. The lithium secondary battery electrolyte includes a lithium salt, non-aqueous organic solvent, and an oxalate derivative. The lithium secondary battery includes a cathode, an anode, a separator, and the lithium secondary battery electrolyte. The lithium secondary battery electrolyte has excellent high-temperature stability, a high discharge capacity at a low temperature, and excellent lifespan characteristics.

Lithium secondary battery electrolyte and lithium secondary battery comprising same

Provided are a lithium secondary battery electrolyte and a lithium secondary battery. The lithium secondary battery electrolyte includes a lithium salt, a non-aqueous organic solvent, and a boron derivative. The lithium secondary battery includes a cathode, an anode, a separator, and the secondary battery electrolyte. The secondary battery electrolyte according to the present invention has advantages of excellent stability at a high temperature, high discharge capacity at a low temperature, and excellent life cycle characteristics.

Provided are an electrolyte for a lithium secondary battery and a lithium secondary battery containing the same. The electrolyte for a secondary battery according to the present invention has excellent high-temperature stability, excellent low-temperature discharge capacity, and excellent life cycle characteristics.

Electrolyte for lithium secondary battery and lithium secondary battery containing the same

Provided are an electrolyte for a lithium secondary battery and a lithium secondary battery containing the same.

Growing community of inventors

Daejeon, South Korea

Kwang Kuk Lee