Semes Co., Ltd.

Kwang-Il Choi

Jeong-Yong Bae

Yong-Nam Choi

Doo-Keun An

Soo-Il Jang

Pyong-Soon Jung

Ju-Won Kim

There is provided a method for liquid mixing supply fabricating a mixed etching solution in which sulfuric acid, hydrogen peroxide, ultra pure water and hydrofluoric act are mixed together. The method includes: supplying a specific liquid chemical to a mixing tank such that it is mixed in ppm units; and supplying at least two liquid chemicals and a ultra pure water to the mixing tank at a predetermined ratio, and mixing them, wherein starting points of supplying the at least two liquid chemicals and the ultra pure water are different from each other. Since the starting points of supplying the sulfuric acid, the hydrogen peroxide, and the ultra pure water are different, it is possible to minimize the heat generation due to the reaction between the sulfuric acid with the hydrogen peroxide.

Method for liquid mixing supply

A supply system for supplying a functional water to a process unit which treats a substrate using the functional water is provided. In the system, the functional water generated in the functional water generator is supplied to a distributor through a functional water supply pipe. Thereafter, the functional water is supplied to the process unit while the process unit performs a process, and the functional water is returned to the functional water generator through a functional water returning pipe while the process unit does not perform a process. A buffer tank is installed in the functional water supply pipe and the concentration of the functional water is measured in a circulation line connected with the buffer tank. When the measured concentration of the functional water goes out of a set concentration range, the functional water is returned to the functional water generator through functional water returning pipe.

System and method for supplying functional water

Growing community of inventors

Chonan-shi, South Korea

Kwang-Il Choi