Ltc Co., Ltd.

Kwang Hyun Ryu

Ho Sung Choi

Jun Young Kim

Hwa Young Kim

Jong Soon Lee

Sang Ku Ha

Hye Sung Yang

Jong Il Bae

Sang Hun Cho

The present invention relates to a highly heat resistant silsesquioxane-based photosensitive resin composition for a liquid crystal display device or an organic EL display device, and a positive resist insulating layer prepared therefrom, and in particular, to a silsesquioxane-based photosensitive resin composition having high heat resistance and a low dielectric property, capable of being used as an insulating layer forming a via hole of the thin film transistor (TFT), and simultaneously, capable of being used as an insulating layer for forming a bank pattern dividing pixels of an organic EL display device.

Highly heat resistant polysilsesquioxane-based photosensitive resin composition

The present invention proposes a method for removing an oxide formed on the surface of a copper film used in the process of manufacturing a circuit for a semiconductor, an organic light-emitting diode, an LED, or a liquid crystal display without causing corrosion on a lower metal film. The composition including corrosive amine may remove a metal oxide depending on the content of additive ranging from 0.01 to 10% regardless of the content of ultrapure water. A polar solvent other than the corrosive amine may efficiently remove an oxide from the surface of the metal when the same contains water and 0.01 to 20% of the additive.

Composition for removing and preventing formation of oxide on the surface of metal wire

Growing community of inventors

Gyeonggi-do, South Korea

Kwang Hyun Ryu