Hoechst Aktiengesellschaft

Kurt Walter Klupfel

Heide Sprengel

Walter Herwig

Raimund J Faust

Klaus Horn

Walter Deucker

Helga Sikora

Hansjorg Vollmann

A process and an aqueous treatment solution for cleaning copper surfaces, in particular for removing residues of photoresist layers, which residues still adhere after development to the cleared copper areas, are described. The solution contains a water-soluble aliphatic sulfonic acid having 8 to 30 carbon atoms or a water-soluble salt thereof.

Process for cleaning copper-containing metal surfaces

A photopolymerizable mixture is described which contains a polymeric binder, a compound which is polymerizable by a free radical mechanism and has at least two ethylenically unsaturated polymerizable groups, a photoinitiator, and additionally contains a disulfide compound of the formula

Photopolymerizable mixture and photopolymerizable copying material

A photopolymerizable mixture for the preparation of printing plates and photoresists is disclosed which contains a polymeric binder, an ethylenically unsaturated polymerizable compound and, as a photoinitiator, a compound having the formula ##STR1## wherein R is an aromatic group which may be substituted and n is 1 or 2.

Photopolymerizable mixture

The present invention relates to a photopolymerizable mixture comprising a compound with at least two terminal ethylenically-unsaturated groups, a boiling point above 100.degree. C. and which is capable of addition polymerization, a polymeric binder, a photoinitiator, and a monoazo dye corresponding to Formula I: ##STR1## R.sub.2 and R.sub.3 are alkyl or alkenyl groups which may be substituted, and R.sub.4 and R.sub.5 are hydrogen or halogen atoms, or alkyl or alkoxy groups.

Photopolymerizable composition comprising a monoazo dye as contrast

This invention relates to an improvement in a photopolymerizable transfer material comprising a flexible base, and a thermoplastic photopolymerizable copying layer, the improvement comprising including an adhesion-imparting substance at the boundary of said copying layer away from said base, said substance having the formula ##STR1## in which n is 0 or an integer from 1 to 3,

Photopolymerizable transfer material

The invention relates to a photopolymerizable copying composition comprising at least one polymerizable compound, at least one photo-initiator, and at least one copolymer of (A) an unsaturated carboxylic acid, (B) an alkyl methacrylate with at least 4 carbon atoms in the alkyl group, and (C) at least one additional monomer which is capable of copolymerization with monomers (A) and (B), the homopolymer of said additional monomer having a glass transition temperature of at least 80.degree.C.

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Wiesbaden-Sonnenberg, Germany

Kurt Walter Klupfel