Infineon Technologies Austria Ag

Infineon Technologies Ag

Infineon Technologies Dresden Gmbh

Kurt Sorschag

Anton Mauder

Hans Weber

Roman Knoefler

Stefan Gamerith

Helmut Strack

Marko Lemke

Dieter Kaiser

Felix Braun

Marcel Heller

Daniel Sarlette

Ingo Meusel

Franz Hirler

Andreas Peter Meiser

Andre Brockmeier

Ulf Bartl

David Baum

Martin Kulterer

A microelectromechanical systems (MEMS) mirror package assembly includes: a MEMS wafer including a stator portion and a rotor portion that includes a MEMS mirror configured to rotate about an axis, wherein the MEMS mirror is suspended over a back cavity, wherein the MEMS wafer defines a first portion of the back cavity; a spacer wafer, wherein the backside of the spacer wafer is bonded to the frontside of the MEMS wafer, wherein the spacer wafer defines a first portion of a front cavity arranged over the MEMS mirror; a transparent cover wafer, wherein the backside of the transparent cover wafer is bonded to the frontside of the spacer wafer, wherein the transparent cover wafer includes a transparent dome structure arranged over the MEMS mirror and defining a second portion of the front cavity. The center of the MEMS mirror is arranged substantially at a vertex of the transparent dome structure.

3D dome wafer-level package for optical mems mirror with reduced footprint

Embodiments of the present invention provide a method for finishing a glass product including a glass layer, the glass layer comprising boron. The method includes the step of cleaning the glass layer in order to remove boron at least at the surface of the glass layer. The step of cleaning includes the substep of esterification using a medium comprising an alcohol.

Method for finishing a glass product and glass product

A method for forming a semiconductor device includes providing a semiconductor substrate having an upper side and comprising, in a vertical cross-section substantially orthogonal to the upper side, a plurality of semiconductor mesas of a first monocrystalline semiconductor material which are spaced apart from each other by sacrificial layers selectively etchable with respect to the first monocrystalline semiconductor material and arranged in trenches extending from the upper side into the semiconductor substrate, forming on the semiconductor mesas a support structure mechanically connecting the semiconductor mesas, at least partly replacing the sacrificial layers while the semiconductor mesas remain mechanically connected via the support structure, and at least partly removing the support structure.

Methods for manufacturing semiconductor devices

A method for producing a semiconductor device is provided. The method includes: forming in a semiconductor substrate a plurality of semiconductor mesas extending to an upper side so that adjacent semiconductor mesas are spaced apart from each other by one of a substantially empty trench and a trench substantially filled with a sacrificial layer selectively etchable with respect to the semiconductor mesas; forming a support structure mechanically connecting the semiconductor mesas spaced apart from each other by one of the substantially empty trench and the trench substantially filled with the sacrificial layer; and processing the semiconductor substrate from the upper side while the semiconductor mesas are mechanically connected via the support structure.

Method for manufacturing a semiconductor device

A semiconductor device with a dielectric layer is produced by providing a semiconductor body with a first trench extending into the semiconductor body, the first trench having a bottom and a sidewall. A first dielectric layer is formed on the sidewall in a lower portion of the first trench and a first plug is formed in the lower portion of the first trench so as to cover the first dielectric layer. The first plug leaves an upper portion of the sidewall uncovered. A sacrificial layer is formed on the sidewall in the upper portion of the first trench and a second plug is formed in the upper portion of the first trench. The sacrificial layer is removed so as to form a second trench having sidewalls and a bottom. A second dielectric layer is formed in the second trench and extends to the first dielectric layer.

Method for producing a semiconductor device including a dielectric layer

A method for producing a semiconductor device is provided. The method includes: providing a wafer including an upper surface and a plurality of semiconductor mesas extending to the upper surface; forming a first support structure made of a first material and adjoining the plurality of semiconductor mesas at the upper surface so that adjacent pairs of the plurality of semiconductor mesas are bridged by the first support structure; forming a second support structure made of a second material different from the first material and adjoining the plurality of semiconductor mesas at the upper surface so that the adjacent pairs of the plurality of semiconductor mesas are bridged by the second support structure; removing the first support structure; and at least partly removing the second support structure.

A method for producing a semiconductor device with an electrode structure includes providing a semiconductor body with a first surface, and with a first sacrificial layer extending in a vertical direction of the semiconductor body from the first surface, and forming a first trench extending from the first surface into the semiconductor body. The first trench is formed at least by removing the sacrificial layer in a section adjacent to the first surface. The method further includes forming a second trench by isotropically etching the semiconductor body in the first trench, forming a dielectric layer which covers sidewalls of the second trench, and forming an electrode on the dielectric layer in the second trench, the electrode and the dielectric layer in the second trench forming the electrode structure.

Method for producing an electrode structure

A transistor with a gate electrode structure is produced by providing a semiconductor body with a first surface, and with a first sacrificial layer extending in a vertical direction of the semiconductor body from the first surface. A first trench extending from the first surface into the semiconductor body is formed by removing the sacrificial layer in a section adjacent the first surface. A second trench is formed by isotropically etching the semiconductor body in the first trench. A third trench is formed below the second trench by removing at least a part of the first sacrificial layer below the second trench. A dielectric layer is formed which at least covers sidewalls of the third trench and which only covers sidewalls of the second trench. A gate electrode is formed on the dielectric layer in the second trench. The gate electrode and dielectric layer in the second trench form the gate electrode structure.

Growing community of inventors

Villach-Landskron, Austria

Kurt Sorschag