Asml Netherlands B.v.

Koninklijke Philips Corporation N.v.

Kurt Gielissen

Maarten Marinus Johannes Wilhelmus Van Herpen

Wouter Anthon Soer

Vadim Yevgenyevich Banine

Yurii Victorovitch Sidelnikov

Johannes Hubertus Josephina Moors

Lucas Henricus Johannes Stevens

Bastiaan Theodoor Wolschrijn

Thomas Stein

Johannes Peterus Henricus De Kuster

Marc Hubertus Lorenz Van Der Velden

Derk Jan Wilfred Klunder

Martin Jacobus Johan Jak

Olav Waldemar Vladimir Frijns

Vladimir Mihailovitch Krivtsun

Konstantin Nikolaevich Koshelev

Vladimir Vitalevich Ivanov

Johannes Christiaan Leonardus Franken

Denis Alexandrovich Glushkov

Oleg Yakushev

Givi Georgievich Zukakishvili

A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy.

Lithographic apparatus

A lithographic apparatus includes a radiation system for providing a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap for trapping material emanating from the radiation source. The rotation contaminant trap includes a multiple number of elements extending in a radial direction from a common rotation trap axis and being arranged for allowing contaminant material emanating from the radiation source to deposit during propagation of the radiation beam in the radiation system. The radiation system further includes a contaminant catch for receiving contaminant material particles from the rotation trap elements, the contaminant catch having a constitution, during operation of the radiation, for retaining said contaminant material particles.

Lithographic apparatus, a radiation system, a device manufacturing method and a radiation generating method

A radiation source may include a radiation emitter for emitting radiation, a collector for collecting radiation emitted by the radiation emitter, and an outlet configured, in use, to introduce a cooled gas into the radiation source.

Radiation source

A debris mitigation system for trapping contaminant material coming from a debris-generating radiation source. The system includes a contamination barrier constructed and arranged to rotate about an axis, and a magnet structure constructed and arranged to provide a magnetic field for deflecting charged debris from the radiation source. The magnet structure is constructed and arranged to provide a magnetic field through the contamination barrier. The magnetic field, when passing through the contamination barrier, is oriented along planes generally coinciding with the axis of rotation of the contamination barrier.

Debris mitigation system and lithographic apparatus

A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Lithographic apparatus, and device manufacturing method

A debris prevention system is constructed and arranged to prevent debris that emanates from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes an aperture that defines a maximum emission angle of the radiation coming from the radiation source, and a first debris barrier having a radiation transmittance. The first debris barrier includes a rotatable foil trap. The debris prevention system also includes a second debris barrier that has a radiation transmittance. The first debris barrier is configured to cover a part of the emission angle and the second debris barrier is configured to cover another part of the emission angle.

Debris prevention system, radiation system, and lithographic apparatus

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Eindhoven, Netherlands

Kurt Gielissen