Robert Boschgmbh

Kurt Burger

Johannes Voigt

Thomas Weber

Heiko Gruner

Guenter Schneider

Heinz Friedrich

Susanne Lucas

Bernd Goetzelmann

Johannes Rauschnabel

Sascha Henke

Klaus Burghoff

Erich Zabler

Manfred Hauser

Heinrich Van De Loecht

Stefan Grosse

Bernd Wilke

Oliver Schmautz

Thomas Beck

Wolfgang Reuter

Karl-Otto Linn

Alexander Schattke

Wolfgang Schmitt

Peter Schottle

Ronald Neidhardt

Wolfgang Szczerba

Jeanne Forget-Funk

Christian Bayer

Thomas Molkner

A pump piston and/or elements sealing the pump piston, in particular a sealing ring of elastomeric material with an additionally applied coating are/is proposed. To improve the durability characteristics, the pump piston and/or the elements sealing the pump piston have a coating which is formed at least predominantly of halogen-, silicon-, carbon-containing and/or metal-organic monomers. Furthermore, a device and a method for coating an object of elastomeric material utilizing a plasma are proposed.

Method for plasma coating an object of elastomeric material

A method is proposed for vacuum-coating a substrate using a plasma-CVD method. In order to control ion bombardment during the vacuum coating, a substrate voltage, produced independently from a coating plasma, is applied to the substrate. The substrate voltage is modified during the coating. The substrate voltage is a direct voltage that is pulsed in bipolar fashion with a frequency of 0.1 kHz to 10 MHz. A wear-resistant and friction-reducing multilayer structure of alternating hard material individual layers and carbon or silicon individual layers is proposed.

Method and device for vacuum-coating a substrate

A method and device for sterilizing containers in which a plasma treatment is executed through excitation of an electromagnetic oscillation so that the plasma is excited in a vacuum in the vicinity of the container regions to be sterilized. Between arrival and discharge, the container regions to be sterilized are moved closer to the oscillation-generating device in the chamber, with continuous movement of the container and/or of the oscillation-generating device for one or more predetermined time intervals in such a way that a plasma is excited in these regions inside and/or outside the container. The chamber is provided with a transport apparatus inside it, which produces an essentially rotating motion of the container during the transport from the arrival to the discharge in the chamber.

Method and device for sterilizing containers

An apparatus for transporting cylindrical objects, in particular containers, has at least two shafts that rotate in the same direction, axially perpendicular to the transporting direction of the objects. While being transported, the objects come to rest with their cylindrical wall on one shaft and with one face end on an adjacent shaft. By means of the axial spacing and/or the respective diameters of the shafts a predeterminable angular position of the objects to the plane of the axes of the shafts and an intrinsic rotation of the objects can be effected.

Device for transporting cylindrical objects

Method and device for coating at least one wiper-blade element

A method is proposed for vacuum-coating a substrate using a plasma-CVD method. In order to control ion bombardment during the vacuum coating, a substrate voltage produced independently from a coating plasma is applied to the substrate. The substrate voltage is modified during the coating. The substrate voltage is a direct voltage that is pulsed in bipolar fashion with a frequency of 0.1 kHz to 10 MHz. A wear-resistant and friction-reducing multilayer structure of alternating hard material individual layers and carbon or silicon individual layers is proposed.

A device for vacuum coating bulk material includes a rotating holder for accommodating the bulk material, a plasma coating source arranged within the rotating holder, as well as a device, arranged within the rotating holder, for cleaning the bulk material using plasma. During the coating process, the rotational speed of the rotating holder is less than the speed necessary for producing a centrifugal force for fixing the bulk material against the inner wall of the rotating holder. The plasma coating source and the plasma cleaning device are arranged in such a way that their spheres of action overlap.

Device for vacuum coating bulk material

Temperature dependent electric resistor probe and a method of making the

A thin-film strain gauge and a method for producing it are proposed; the strain gauge is advantageously capable of integration into a thin-film circuit. The strain gauge comprises an elastically deformable spring element in combination with at least one elongation-sensitive resistor. The resistor disposition (R1-R4), the low-impedance connections (L11-L42) between the various resistance regions and the associated connection tracks (L5-L8) are applied in a vacuum process, preferably by cathode sputtering. The low-impedance connections (L11-L42) and the connection tracks (L5-L8) are of material which, although different from the material making up the actual resistance region, still has approximately the same temperature coefficient of resistance, so as to preclude errors caused by temperature.

Method of making a thin-film strain gauge

A method of manufacturing a self-supporting measuring probe suitable for application in a highly corrosive environment such as for example in a muffler or suction channel of a motor vehicle, is disclosed. The probe is provided with a protective foil which is applicable on a rigid substrate carrying the measuring layers, by means of a heat sealing process in which heat and pressure are simultaneously applied on the foil. In a preferred embodiment, the edges of the foil are fused to the substrate by a laser beam.

Method of manufacturing corrosion-resistant measuring probes

Thin-film strain gauge

To form a temperature sensor, for example suitable in an automotive vehicle, to determine ambient temperatures, or to provide a temperature compensated thin-film circuit, for example for incorporation with an oscillator circuit, two stable thin-film layers are applied to a non-conductive substrate, the layers being capable of being etched. The overall temperature coefficient of resistance can be matched to a predetermined value by selective interconnection of at least two thin-film resistance elements formed by the thin films, of which one thin film resistance element for example comprises a nickel layer over a tantalum base, with a predetermined temperature coefficient of resistance, the other resistance element merely being the tantalum layer with essentially zero temperature coefficient of resistance, the overall temperature coefficient of resistance of the combination being determined by adjustment of the relative resistance values after measurement of the temperature coefficient of resistance of the nickel-tantalum layer to determine its actual temperature coefficient so that, in spite of tolerances in the manufacture of the thin films, interchangeable elements of highly accurate overall resistance and temperature coefficient of resistance values can be obtained.

Controlled temperature coefficient thin-film circuit element

Growing community of inventors

Friolzheim, Germany

Kurt Burger