Hoechst Aktiengesellschaft

Kurd Gunther

Elmar Schrinner

Helmut Diery

Gerhart Schneider

New compounds of the general formula II ##EQU1## in which one or two of the radicals R.sub.i (i = 1 to 7) stands for a linear or branched alkyl or alkenyl radical of 8 to 18 carbon atoms, one or two of the radicals R.sub.m (m = 2 to 6, m being .noteq. i) stands for the radical of the formula A ##EQU2## and the other radicals R.sub.k (k = 1 to 7, k being .noteq. i, m) stand for hydrogen or methyl, Y stands for hydrogen or an alkali metal ion, n is 2 or 3 and o and p are 0 or 1, their use as anti-microbially active surfactants in washing and cleansing compositions and disinfectants, and a process for preparing those compounds of formula II.

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Diedenbergen, Taunus, undefined

Kurd Gunther