Boe Technology Group Co., Ltd.

Hefei Boe Optoelectronics Technology Co., Ltd.

Kuohua Liao

Rui Zhang

Duanming Li

Beum Ku Park

A vapor deposition apparatus, including: a reaction device having a reaction chamber; a first gas duct connected to the reaction chamber and configured to direct a process gas into the reaction chamber; a gas ionization device connected to the reaction device and configured to ionize a cleaning gas; and a second gas duct connected to the gas ionization device and configured to direct the cleaning gas into the gas ionization device; a common gas duct; and a three-way control mechanism. An end of the common gas duct is connected to the reaction chamber and the other end of the common gas duct is connected to a first gas port of the three-way control mechanism; the first gas duct and the gas ionization device are connected to a second gas port and a third gas port of the three-way control mechanism, respectively.

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Beijing, China

Kuohua Liao