Industrial Technology Research Institute

Kuo-Tung Lin

Yuh-Zheng Lee

Chao-Feng Sung

Yi-An Sha

Wen-Chun Chen

Jhih-Ping Lu

Chen-Chun Hsu

A display panel including a substrate, a first electrode layer, a plurality of partition structures, a liquid display medium, a cap layer, a buffer layer and a second electrode layer is provided. The first electrode layer is disposed on the substrate. The partition structures are disposed on the first electrode layer, exposing a part of the first electrode layer. The liquid display medium is disposed on the first electrode layer between the partition structures. The cap layer is formed on the liquid display medium, and a buffer layer is formed on the cap layer. The second electrode layer is disposed on the buffer layer.

Display panel and fabricating method thereof

Fabrication methods for electronic devices with via through holes and thin film transistor devices are presented. The fabrication method the electronic device includes providing a substrate, forming a patterned lower electrode on the substrate, and forming a photosensitive insulating layer on the substrate covering the patterned lower electrode. A patterned optical shielding layer is applied on the photosensitive insulating layer. Exposure procedure is performed curing the exposed photosensitive insulating layer. The optical shielding layer and the underlying photosensitive insulating layer are sequentially removed, thereby forming an opening. A patterned upper electrode is formed on the photosensitive insulating layer filling the opening to create a conductive via hole.

Fabrication methods for electronic devices with via through holes and thin film transistor devices

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Taipei County, Taiwan

Kuo-Tung Lin