Advanced Semiconductor Engineering, Inc.

Kuo-Pin Yang

Wei-Min Hsiao

Su Tao

Meng-Jen Wang

Tai-Chun Huang

Jen-Kuang Fang

Chih-Ming Chung

Kuo-Hua Chen

Wei-Chung Wang

Chian-Chi Lin

Jen-Chuan Chen

Hui-Shan Chang

Sung-Mao Wu

Sheng-Yang Peng

Yu-Pen Tsai

Chia-Lin Hung

Hsueh-An Yang

Cheng-Hui Hung

Wu-Chung Chiang

The present invention provides a temporary carrier bonding and detaching process. A first surface of a semiconductor wafer is mounted on a first carrier by a first adhesive layer, and a first isolation coating disposed between the first adhesive layer and the first carrier. Then, a second carrier is mounted on the second surface of the semiconductor wafer. The first carrier is detached. Then, the first surface of the semiconductor wafer is mounted on a film frame. The second carrier is detached. The method of the present invention utilizes the second carrier to support and protect the semiconductor wafer, after which the first carrier is detached. Therefore, the semiconductor wafer will not be damaged or broken, thereby improving the yield rate of the semiconductor process. Furthermore, the simplicity of the detaching method for the first carrier allows for improvement in efficiency of the semiconductor process.

Carrier bonding and detaching processes for a semiconductor wafer

The present invention relates to a stacked semiconductor package and a method for making the same. The method includes the steps of mounting a plurality of first dice to a wafer by conducting a reflow process; and thinning the wafer from the backside surface of the wafer, thereby reducing manufacturing time and preventing warpage.

Semiconductor package with through silicon vias and method for making the same

The present invention relates to a method for forming a via in a substrate and a substrate with a via. The method includes the following steps: (a) providing a substrate; (b) forming a groove on a first surface of the substrate; (c) forming a conductive metal on the groove so as to form a central groove; (d) forming an annular groove that surrounds the conductive metal; (e) forming an insulating material in the central groove and the annular; groove; and (f) removing part of the substrate to expose the conductive metal and the insulating material.

Method for forming a via in a substrate and substrate with a via

The present invention relates to a chip having a bump and a package having the same. The chip includes a chip body, at least one via, a passivation layer, an under ball metal layer and at least one bump. The via penetrates the chip body, and is exposed to a surface of the chip body. The passivation layer is disposed on the surface of the chip body, and the passivation layer has at least one opening. The opening exposes the via. The under ball metal layer is disposed in the opening of the passivation layer, and is connected to the via. The bump is disposed on the under ball metal layer, and includes a first metal layer, a second metal layer and a third metal layer. The first metal layer is disposed on the under ball metal layer. The second metal layer is disposed on the first metal layer. The third metal layer is disposed on the second metal layer. As the bumps can connect two chips, the chip is stackable, and so the density of the product is increased while the size of the product is reduced.

Chip having a bump and package having the same

The present invention relates to a silicon substrate having through vias and a package having the same. The silicon substrate includes a substrate body, a plurality of through vias and at least one heat dissipating area. The substrate body has a surface, and the material of the substrate body is silicon. The through vias penetrate the substrate body, and each of the through vias has a conductive material therein. The heat dissipating area is disposed on the surface of the substrate body and covers at least two through vias. The heat dissipating area is made of metal, and the through vias inside the heat dissipating area have same electrical potential. Thus, the heat in the through vias is transmitted to the heat dissipating area, and since the area of the heat dissipating area is large, the silicon substrate has good heat dissipation efficiency.

Silicon substrate having through vias and package having the same

The invention relates to a microelectromechanical microphone packaging system. The microelectromechanical microphone packaging system comprises a substrate, a chip, a microelectromechanical microphone, a conductive glue, a non-conductive glue and a cover. The substrate has a first surface. The chip is mounted on the first surface of the substrate. The microelectromechanical microphone is mounted on the first surface of the substrate, and electrically connected to the chip. The chip is enclosed by the non-conductive glue. The non-conductive glue is enclosed by the conductive glue. The cover is mounted on the first surface of the substrate to form a containing space, and has an acoustic aperture. The microelectromechanical microphone packaging system utilizes the conductive glue enclosing the chip and the non-conductive glue to shield interference from outside noise and obtain a shielding effect. In addition, the cover does not need to be made of metal material.

Microelectromechanical microphone packaging system

A semiconductor packaging structure having electromagnetic shielding function is disclosed, in which the packaging structure includes a carrier and a semiconductor substrate disposed thereon. The semiconductor substrate has a patterned passivation layer and a patterned metal layer disposed thereon, in which the patterned metal layer is electrically connected to at least a grounding pad of the carrier via a wire, whereby possessing the semiconductor packaging structure to have electromagnetic shielding function. A method for manufacturing a semiconductor packaging structure having electromagnetic shielding function is also disclosed in the present invention.

Semiconductor packaging structure having electromagnetic shielding function and method for manufacturing the same

A method for encapsulating sensor chips is disclosed. A protective layer is formed on an active surface of a sensor chip, and at least covers a sensor region in the active surface. The active surface of the sensor chip faces to a temporary carrier, so that the protective layer is attached to the temporary carrier. An encapsulant is formed on the temporary carrier to cover a back surface and side surfaces of the sensor chip. A plurality of electrically connecting components are formed in the encapsulant to electrically connect a plurality of bonding pads of the sensor chip, and then the protective layer is removed to expose the sensor region. The coverage of the protective layer is used to avoid pollution on the sensor region during encapsulating, thereby, especially in a wafer level packaging, making the package profile neat, tidy and smaller in size, and promoting production efficiency.

Method for encapsulating sensor chips

A package structure and a fabricating method thereof are provided. The package structure includes a soft board and an optical chip. The soft board has a surface with a bump disposed thereon. The optical chip includes a main body and a conductive pillar. The main body has an active surface and a non-active surface opposite to the active surface. The active surface has a sensing area and a contact pad electrically connected with each other. The non-active surface is attached to the surface. The conductive pillar is disposed inside the main body, and penetrates the active surface and the non-active surface. The conductive pillar has a first end electrically connected to the contact pad and a second end electrically connected to the bump.

Package optical chip with conductive pillars

A method of fabricating wafer level package is provided. First, a wafer having a front and a rear surfaces is provided. Several fosses are then formed on the front surface of the wafer. Next, an insulative layer is formed on a surface of each fosse; a conductive layer is then formed on part of the front surface of the wafer and the insulative layer of each fosse. A solder layer is formed on the conductive layer above each fosse. Afterward, a first substrate is attached to the front surface. Several holes are formed on the rear surface, and the holes baring the solder layer are positioned corresponding to the fosses. Then, a second substrate is attached to the rear surface of the wafer. The second substrate has several conductive pillars correspondingly inserted into the holes for connecting the solder layers. Next, the conductive structures are formed on the second substrate.

Method of fabricating wafer level package

A method of fabricating wafer level package is provided. The method includes the following steps. Firstly, a wafer having a front surface and a rear surface is provided, and the front surface has several conductive pads. Next, a supporting material is attached on the front surface. Then, several holes are formed on the wafer, and the holes run from the rear surface to the front surface. A first substrate is attached on the rear surface. The first substrate has several conductive pillars correspondingly inserted into the holes. Afterwards, the supporting material is removed to expose the conductive pillars on the front surface, and a patterned circuit is formed on the front surface. Next, a second substrate is attached on the patterned circuit. Then, several conductive structures are formed on the first substrate.

In wafer-level formation of a package structure of semiconductor, multitudes of conductive connection structures are formed protruded from a transparent substrate. Multitudes of grooves are formed in a semiconductor wafer and an adhesive is filled therein. The wafer and the transparent substrate are jointed in which each of the conductive connection structures are positioned in one of the grooves and exposed outside of another surface of the semiconductor wafer. A package structure is obtained by sawing the wafer and has electrical connection between the signals of the active side and back side through the conductive connection structures.

Package structure of semiconductor and wafer-level formation thereof

A method for forming an underfill layer on a bumped wafer is disclosed. A film is provided wherein the film includes a base layer, a removable layer and the underfill layer. The film is disposed on a bump wafer and then pressing the film under heating is performed to have the bumps of the wafer embedded in the underfill layer. Then, the removable layer with base film attached thereto is removed, so the underfill layer well encloses the bumps of the wafer and is easily separated from the base film layer and the removable layer without damaging the bumps formed on the wafer.

Method for preparing arylphosphonite antioxidant

A strip mainly includes a plurality of guide holes, a plurality of position holes, a plurality of separation holes, a plurality of second slots and a plurality of substrate areas. Guide holes are arranged on two sides of the strip for carrying during processing, and position holes are arranged at four corners of the strip for positioning on the machine during processing. Separation holes and slots are to be contiguous to the substrate areas and separate the substrate areas from one another so that the discontinuous warpage of the substrate area affects the peripheral substrate areas. Therefore, it can reduce the chance of breaking chip in the substrate area. The two ends of the substrate are adjacent to the slots to reduce the stress of other substrates in the longitudinal direction actuating the chip during heat treatment in processing. The strip further includes a metal layer surrounding the substrate areas to increase the stiffness of the entirety of the strip.

Strip of semiconductor package

A chip-scale semiconductor package mainly includes a semiconductor chip, a substrate and a package body. Said chip is attached onto said substrate by an adhesive layer. Said chip has a plurality of bonding pads formed thereon. Said adhesive layer has an aperture corresponding to the bonding pads of said chip such that the bonding pads can be exposed within an aperture. Said substrate has several through-holes respectively corresponding to the bonding pads of said chip and parts of the area around the edge of said chip for dispensing of encapsulant after the soldering of leads of said substrate to the bonding pads of said chip. The encapsulant dispensed into the through-holes can flow from the surface of said chip to the edge thereof. Said package body has one portion provided within the through-hole of said substrate and another portion provided around the edge of said chip whereby encapsulation process is accomplished without having to turn the whole semiconductor package device.

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Kaohsiung, Taiwan

Kuo-Pin Yang