United Microelectronics Corp.

Kuo-Lung Li

Ping-Chia Shih

Chi-Cheng Huang

Chih-Hao Pan

Hsiang-Chen Lee

Chia-Wen Wang

Zi-Jun Liu

Po-Hsuan Chen

Szu-Ping Wang

Meng-Chun Chen

Chao-Sheng Cheng

Wen-Peng Hsu

Yu-Chun Chang

An-Hsiu Cheng

Chuan-Fu Wang

Chun-Hung Cheng

Chih-Hung Wang

Shu-Hung Yu

Chih-Yao Wang

Kun-I Chou

Ling-Hsiu Chou

Chung-Che Huang

Hung-Wei Lin

Chia-Hui Huang

Chih-Yang Hsu

Chia-Cheng Hsu

Shao-Nung Huang

Wei-Pin Huang

Cheng-Hua Chou

Mu-Jia Liu

A memory cell includes a substrate. A first STI and a second STI are embedded within the substrate. The first STI and the second STI extend along a first direction. An active region is disposed on the substrate and between the first STI and the second STI. A control gate is disposed on the substrate and extends along a second direction. The first direction is different from the second direction. A tunneling region is disposed in the active region overlapping the active region. A first trench is embedded within the tunneling region. Two second trenches are respectively embedded within the first STI and the second STI. The control gate fills in the first trench and the second trenches. An electron trapping stack is disposed between the tunneling region and the control gate.

Memory cell and fabricating method of the same

A method for fabricating gate structures includes providing a substrate, configured to have a first region and a second region. Dummy gate structures are formed on the substrate at the first and second regions, wherein each of the dummy gate structures has a first gate insulating layer on the substrate and a dummy gate on the first gate insulating layer. An inter-layer dielectric layer is formed over the dummy gate structures. The inter-layer dielectric layer is polished to expose all of the dummy gates. The dummy gates are removed. The first gate insulating layer at the second region is removed. A second gate insulating layer is formed on the substrate at the second region, wherein the first gate insulating layer is thicker than the second insulating layer. Metal gates are formed on the first and the second insulating layer.

Method for fabricating gate structures

A non-volatile memory device is provided. The non-volatile memory device includes a substrate, a first gate structure disposed on the substrate, a second gate structure disposed on the substrate, and a memory gate structure disposed on the substrate and between the first gate structure and the second gate structure. The memory gate structure at least covers the first gate structure and the second gate structure. The memory gate structure includes a charge storage layer disposed on the substrate and a memory gate layer disposed on the charge storage layer.

Non-volatile memory device and method for manufacturing the same

A method for fabricating a semiconductor structure is shown. A first gate of a first device and a second gate of a second device are formed over a semiconductor substrate. First LDD regions are formed in the substrate beside the first gate using the first gate as a mask. A conformal layer is formed covering the first gate, the second gate and the substrate, wherein the conformal layer has sidewall portions on sidewalls of the second gate. Second LDD regions are formed in the substrate beside the second gate using the second gate and the sidewall portions of the conformal layer as a mask.

Method for fabricating semiconductor structure

Provided is a semiconductor structure including a substrate, an isolation structure, a fuse and two gate electrodes. The isolation structure is located in the substrate and defines active regions of the substrate. The fuse is disposed on the isolation structure. The gate electrodes are disposed on the active regions and connected to ends of the fuse. In an embodiment, a portion of a bottom surface of the fuse is lower than top surfaces of the active regions of the substrate.

Semiconductor structure and method of forming the same

A semiconductor memory device includes a substrate, having a plurality of cell regions, wherein the cell regions are parallel and extending along a first direction. A plurality of STI structures is disposed in the substrate, extending along the first direction to isolate the cell regions, wherein the STI structures have a uniform height lower than the substrate in the cell regions. A selection gate line is extending along a second direction and crossing over the cell regions and the STI structures. A control gate line is adjacent to the selection gate line in parallel extending along the second direction and also crosses over the cell regions and the STI structures. The selection gate line and the control gate line together form a two-transistor (2T) memory cell.

Semiconductor memory device and fabrication method thereof

A non-volatile memory device includes a semiconductor substrate, a control gate electrode, a first oxide-nitride-oxide (ONO) structure, a selecting gate electrode, a second ONO structure, and a spacer structure. The control gate electrode and the selecting gate electrode are disposed on the semiconductor substrate. The first ONO structure is disposed between the control gate electrode and the semiconductor substrate. The second ONO structure is disposed between the control gate electrode and the selecting gate electrode in a first direction. The spacer structure is disposed between the control gate electrode and the second ONO structure in the first direction. A distance between the control gate electrode and the selecting gate electrode in the first direction is smaller than or equal to a sum of a width of the second ONO structure and a width of the spacer structure in the first direction.

Non-volatile memory device with reduced distance between control gate electrode and selecting gate electrode and manufacturing method thereof

Semiconductor structure and method for fabricating the same

The invention provides a method for fabricating a silicon-oxide-nitride-oxide-silicon (SONOS) non-volatile memory cell, comprising: (S) forming a pad oxide pattern on a silicon substrate having a recess exposing a tunnel region of the silicon substrate; (S) forming a bottom oxide layer, a nitride layer, a top oxide layer covering the recess and the pad oxide pattern to form a first ONO structure; (S) forming a photoresist on the first ONO structure covering the recess and a peripheral region of the pad oxide pattern; (S) removing a part of the first ONO structure exposed by the photoresist to form an U-shaped ONO structure; (S) trimming the photoresist to exposed a part of the U-shaped ONO structure above the recess; (S) removing the part of the U-shaped ONO structure; (S) removing the photoresist; (S) removing the pad oxide pattern and the top oxide layer; and (S) forming a gate structure.

Method for fabricating a silicon-oxide-nitride-oxide-silicon (SONOS) non-volatile memory cell

A method for fabricating a semiconductor device includes forming a patterned multi-layered dielectric film on a substrate; forming a patterned stack on the patterned multi-layered dielectric film so that an edge of the patterned multi-layered dielectric film is exposed from the patterned stack; forming a cover layer to cover a part of the substrate and expose the patterned stack and the exposed edge of the patterned multi-layered dielectric film; removing at least a part of the exposed edge of the patterned multi-layered dielectric film by using the cover layer and the patterned stack as an etching mask; and performing an ion implantation process by using the cover layer as an etching mask so as to form a doped region.

Method for fabricating semiconductor device including a patterned multi-layered dielectric film with an exposed edge

A method for fabricating a non-volatile memory semiconductor device is disclosed. The method includes the steps of providing a substrate; forming a gate pattern on the substrate, wherein the gate pattern comprises a first polysilicon layer on the substrate, an oxide-nitride-oxide (ONO) stack on the first polysilicon layer, and a second polysilicon layer on the ONO stack; forming an oxide layer on the top surface and sidewall of the gate pattern; performing a first etching process to remove part of the oxide layer; and performing a second etching process to completely remove the remaining oxide layer.

Method for fabricating non-volatile memory semiconductor device

Growing community of inventors

Yunlin County, Taiwan

Kuo-Lung Li