Taiwan Semiconductor Manufacturing Comp. Ltd.

Kuo-Lian Lu

Yu-Kung Hsiao

Fu-Tien Weng

Bii-Junq Chang

Chiu-Kung Chang

Within a method for forming an image array optoelectronic microelectronic fabrication there is first provided a substrate. There is then formed at least in part over the substrate a bidirectional array of image array optoelectronic microelectronic pixel elements comprising a plurality of series of patterned color filter layers corresponding with a plurality of colors. Within the method, at least one series of patterned color filter layers within the plurality of series of patterned color filter layers corresponding with at least one color within the plurality of colors is formed employing a photolithographic method which employs a plurality of separate photoexposure steps for forming a plurality of separate sub-series of patterned color filter layers within the series of patterned color filter layers corresponding with the at least one color within the plurality of colors. By employing the plurality of separate photoexposure steps for forming the plurality of separate sub-series of patterned color filter layers within the series of patterned color filter layers corresponding with the at least one color within the plurality of colors, the image array optoelectronic microelectronic fabrication is formed with enhanced resolution.

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Hsin-Chu, Taiwan

Kuo-Lian Lu