Nan Ya Technology Corporation

Kuo-Kuei Fu

Yuan-Hsun Wu

Ya-Chih Wang

The present disclosure relates to a replaced photomask including a substrate and a plurality of etched patterns. The plurality of etched patterns are formed on the substrate according to a photomask layout which has a plurality of photomask layout patterns categorized into a plurality of first groups. Each of the first groups includes a plurality of identical initial layout patterns, and each of the first groups is reproduced from an initial layout having a plurality of initial layout patterns categorized into a plurality of second groups to which the plurality of first groups respectively correspond, wherein the plurality of photomask layout patterns respectively correspond to the plurality of initial layout patterns and at least one of the plurality of the photomask layout patterns is replaced by a standardized photomask layout pattern.

Replaced photomask

The present invention relates to a matching method of pattern layouts from inverse lithography, which makes the pattern cells in the same groups identical to avoid a repeated verification and to improve the yield. The method comprises the step of: analyzing a target designed layout by hierarchy; categorizing the pattern cells with the same shape into a group; inversing the target designed layout by inverse lithography; inspecting the inversed pattern cells in the group with each other and replacing the variant ones to make all the inversed pattern cells identical.

Matching method for designing layout patterns on a photomask from inverse lithography

A phase-shift mask for forming a pattern includes a glass substrate and a pattern, a first phase-shift region, a second phase-shift region and a third phase-shift region on the glass substrate. The first phase-shift region and the second phase-shift region are alternately arranged and the third phase-shift regions are formed at the terminal ends of the first phase-shift region.

Growing community of inventors

Taoyuan County, Taiwan

Kuo-Kuei Fu