Au Optronics Corporation

Kuo-Kuang Chen

Wen-Pin Chen

Tsu-Wei Chen

Ting-Chang Chang

Shih-Hsing Hung

Ming-Yen Tsai

Chih-Ling Hsueh

Tsung-Hsiang Shih

Chen-Shuo Huang

Kuo-Jui Chang

Wen-Tai Chen

Hong-Syu Chen

Kent-Yi Lee

Yu-Xin Yang

Teng-Ke Chen

An active device substrate includes a substrate, an active device and a barrier layer. The active device is located on the substrate. The barrier layer is located on the active device. The barrier layer includes a first hydrogen atom distribution region and a second hydrogen atom distribution region. The first hydrogen atom distribution region includes silicon nitride and hydrogen atom. The first hydrogen atom distribution region is located between the second hydrogen atom distribution region and the substrate. The second hydrogen atom distribution region includes silicon nitride and hydrogen atom. The concentration of nitrogen atom in the first hydrogen atom distribution region is less than the concentration of nitrogen atom in the second hydrogen atom distribution region. The highest concentration of hydrogen atom in the first hydrogen atom distribution region is greater than the highest concentration of hydrogen atom in the second hydrogen atom distribution region.

Active device substrate and fabrication method of active device substrate

A light emitting device including a base, a first electrode, a barrier structure layer, a light emitting layer and a second electrode is provided. The barrier structure layer includes a first barrier layer in contact with the first electrode, a second barrier layer and a third barrier layer. The first barrier layer, the second barrier layer and the third barrier layer stack sequentially. The materials of the first barrier layer and the third barrier layer include a dielectric material. The material of the second barrier layer includes a metal material. A boundary between the third barrier layer and the second barrier layer keeps a vertical distance from the first electrode. The light emitting structure layer is disposed between the first electrode and the second electrode and surrounded by the barrier structure layer. The thickness of the light emitting structure layer is not greater than the vertical distance.

Light emitting device

A thin film includes a substrate, a bottom gate, a channel layer, a source and a drain, and a top gate. The bottom gate is disposed on the substrate. The channel layer is disposed on the bottom gate. The source and the drain are disposed on two different sides of the channel layer. The top gate is disposed on the channel layer, wherein the channel layer is disposed between the bottom gate and the top gate, and the bottom gate and the top gate are electrically isolated from each other. A related method is also provided.

Thin film transistor and operating method thereof

A method of manufacturing an array substrate of a display is provided. The method includes forming a first bank material layer on a first substrate, wherein a material of the first bank material layer includes hydrophobic element; patterning the first bank material layer to form a first bank having at least one first concave; forming a first electrode on the first bank and in the first concave after the step of patterning the first bank material layer to form the first bank; and forming an color layer on the first electrode.

Array substrate of display and method of manufacturing the same

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Hsin-Chu, Taiwan

Kuo-Kuang Chen