Industrial Technology Research Institute

Kuo-Hsin Lin

Li-Duan Tsai

Hsiao-Chun Huang

Yu-Ming Lin

Chiu-Ping Huang

Wen-Hsuan Chao

Jiunn-Nan Lin

Pin-Hsin Yang

Hao-Ming Chen

A method for manufacturing nitride catalyst is provided, which includes putting a Ru target and an M target into a nitrogen-containing atmosphere, in which M is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn. The method also includes providing powers to the Ru target and the M target, respectively. The method also includes providing ions to bombard the Ru target and the M target for depositing MRuNon a substrate by sputtering, wherein 0<x<1.3, 0.7<y<2, and x+y=2, wherein MRuZis cubic crystal system or amorphous.

Method for manufacturing nitride catalyst

A membrane electrode assembly includes a first electrode, a second electrode, and an anion exchange membrane disposed between the first electrode and the second electrode. The first electrode includes a first metal mesh, a first catalyst layer wrapping the first metal mesh, a second metal mesh, and a second catalyst layer wrapping the second metal mesh. The first metal mesh is disposed between the anion exchange membrane and the second metal mesh. The second metal mesh is thicker than the first metal mesh, and the first catalyst layer is thicker than the second catalyst layer. The second catalyst layer is iron, cobalt, manganese, zinc, niobium, molybdenum, ruthenium, platinum, gold, or aluminum. The second catalyst layer is crystalline.

Membrane electrode assembly and method for hydrogen evolution by electrolysis

A method for manufacturing catalyst material is provided, which includes putting an M' target and an M&#x2033; target into a nitrogen-containing atmosphere, in which M&#x2032; is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn, and M&#x2033; is Nb, Ta, or a combination thereof. Powers are provided to the M&#x2032; target and the M&#x2033; target, respectively. Providing ions to bombard the M&#x2032; target and the M&#x2033; target to sputtering deposit M&#x2032;M&#x2033;Non a substrate, wherein 0.7&#x2264;a&#x2264;1.7, 0.3&#x2264;b&#x2264;1.3, and a+b=2, wherein M&#x2032;M&#x2033;Nis a cubic crystal system.

Catalyst material and method for manufacturing the same

A method for hydrogen evolution by electrolysis includes soaking a membrane electrode assembly into an alkaline aqueous solution. The membrane electrode assembly includes an anode having a first catalyst layer on a first gas-liquid diffusion layer, a cathode having a second catalyst layer on a second gas-liquid diffusion layer, and a cationic exchange membrane between the first catalyst layer of the anode and the second catalyst layer of the cathode. The first catalyst layer, the second catalyst layer, or both of the above has a chemical structure of MRuN, wherein M is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn, 0&#x3c;x&#x3c;1.3, 0.7&#x3c;y&#x3c;2, and x+y=2, wherein MRuNis cubic crystal system or amorphous. The method also applies a voltage to the anode and the cathode for electrolysis of the alkaline aqueous solution, thereby producing hydrogen at the cathode and producing oxygen at the anode.

A membrane electrode assembly includes an anode having a first catalyst layer on a first gas-liquid diffusion layer, a cathode having a second catalyst layer on a second gas-liquid diffusion layer, and an anionic exchange membrane between the first catalyst layer of the anode and the second catalyst layer of the cathode. The first catalyst layer has a chemical structure of M'M&#x2033;Nor M&#x2032;M&#x2033;C, wherein M&#x2032; is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn, M&#x2033; is Nb, Ta, or a combination thereof, 0.7&#x2264;a&#x2264;1.7, 0.3&#x2264;b&#x2264;1.3, a+b=2, 0.24&#x2264;c&#x2264;1.7, 0.3&#x2264;d&#x2264;1.76, and 0.38&#x2264;e&#x2264;3.61, wherein M&#x2032;M&#x2033;Nis a cubic crystal system and M&#x2032;M&#x2033;Cis a cubic crystal system or amorphous.

A method for manufacturing nitride catalyst is provided, which includes putting a Ru target and an M target into a nitrogen-containing atmosphere, in which M is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn. The method also includes providing powers to the Ru target and the M target, respectively. The method also includes providing ions to bombard the Ru target and the M target for depositing MRuNon a substrate by sputtering, wherein 0&#x3c;x&#x3c;1.3, 0.7&#x3c;y&#x3c;2, and x+y=2, wherein MRuZis cubic crystal system or amorphous.

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Hsinchu, Taiwan

Kuo-Hsin Lin