Powerchip Semiconductor Manufacturing Corporation

Sanyang Industry Co., Ltd.

Kuo-Fang Huang

Shih-Ping Lee

Po-Yi Wu

Shyng-Yeuan Che

Hsiao-Pei Lin

Yu-Cheng Lu

Chia-Hsien Kuo

Jia-Ling Lee

Chen-Tung Lai

Shin-Chang Lee

Provided is a memory structure including first and second transistors, an isolation structure, a conductive layer and a capacitor. Each of the first and second transistors includes a gate disposed on the substrate and source/drain regions disposed in the substrate. The isolation structure is disposed in the substrate between the first and second transistors. The conductive layer is disposed above the first and second transistors and includes a circuit portion electrically connected to the first and second transistors and a dummy portion located above the isolation structure. The capacitor is disposed between the first and second transistors. The capacitor includes a body portion and first and second extension portions. The first and second extension portions extend from the body portion to the source/drain regions of the first and the second transistors, respectively. The first and second extension portions are disposed between the circuit portion and the dummy portion, respectively.

Memory structure

Provided is a memory structure including first and second transistors, an isolation structure, a conductive layer, and a capacitor. The first transistor and the second transistor are disposed on a substrate. Each of the first and second transistors includes a gate disposed on the substrate and two source/drain regions disposed in the substrate. The isolation structure is disposed in the substrate between the first and the second transistors. The conductive layer is disposed above the first transistor and the second transistor, and includes a circuit portion, a first dummy portion, and a second dummy portion, wherein the circuit portion is electrically connected to the first transistor and the second transistor, the first dummy portion is located above the first transistor, and the second dummy portion is located above the second transistor. The capacitor is disposed on the substrate and located between the first dummy portion and the second dummy portion.

Provided is a memory structure including first and second transistors, an isolation structure, a conductive layer and a capacitor. Each of the first and second transistors includes a gate disposed on the substrate and source/drain regions disposed in the substrate. The isolation structure is disposed in the substrate between the first and second transistors. The conductive layer is disposed above the first and second transistors and includes a circuit portion and a dummy portion. The circuit portion is electrically connected to the first and second transistors. The dummy portion is located above the isolation structure. The capacitor is disposed between the first and second transistors. The capacitor includes a body portion and first and second extension portions. The first and second extension portions extend from the body portion to the source/drain regions of the first and the second transistors, respectively. The first and second extension portions are disposed between the circuit portion and the dummy portion, respectively.

Memory structure and manufacturing method thereof

A static random-access memory structure includes a substrate, a first conductive type transistor, a second conductive type transistor and a capacitor unit. The first conductive type transistor and the second conductive type transistor are disposed on the surface of the substrate, and the capacitor unit is positioned between the transistors. The capacitor unit includes a first electrode, a second electrode, and a dielectric layer disposed between the first electrode and the second electrode. The first electrode includes a plurality of first protrudent portions and a planar portion. The first protrudent portions are connected to the first planar portion and protrude from the top surface of the planar portion. The second electrode covers the top surface of the first protrudent portions and formed between adjacent first protrudent portions.

Growing community of inventors

Hsinchu, Taiwan

Kuo-Fang Huang