Chimei Innolux Corporation

Kuo-Chao Chen

Te-Yu Lee

Yu-Chung Liu

Te-Chang Wan

Mei-Ling Chang

Chieh-Wen Lin

Kuan-Chih Chen

A system for displaying images. The system includes a thin film transistor (TFT) device including a first gate layer disposed on a first region of a substrate and covered by a first insulating layer. A first polysilicon active layer is disposed on the first insulating layer and a second polysilicon layer is disposed on a second region of the substrate. A second insulating layer covers both of the first and second polysilicon gate layers. Second and third gate layers are respectively disposed on the second insulating layer above the first and second polysilicon active layers. A method for fabricating a system for displaying images including the TFT device is also disclosed.

Thin film transistor devices for OLED displays and method for fabricating the same

A system for displaying images. The system includes a thin film transistor (TFT) device including a first insulating layer covering a first region and a second region of a substrate. A first polysilicon active layer is disposed in the first region and between the substrate and the first insulating layer. A second polysilicon active layer is disposed on the first insulating layer in the second region. A polysilicon gate layer is disposed above the first polysilicon active layer. A second insulating layer covers the polysilicon gate layer and the second polysilicon active layer. A metal gate layer is disposed above the second polysilicon active layer. A method for fabricating the system for displaying images including the TFT device is also disclosed.

Thin film transistor devices with different electrical characteristics and method for fabricating the same

A display panel is used with an image display system. The display panel includes a light-transmissive substrate, a gate insulating layer, a gate conductor, a first light-shielding structure, a channel layer and a second light-shielding structure. The gate insulating layer is formed over the light-transmissive substrate. The gate conductor and the first light-shielding structure are made of the same material, formed over the gate insulating layer, and electrically isolated from each other. The first light-shielding structure has a hollow portion. The channel layer and the second light-shielding structure made of the same material and formed over the light-transmissive substrate but under the gate insulating layer. The second light-shielding structure is disposed under the hollow portion of the first light-shielding structure.

Growing community of inventors

Sinwu, Taiwan

Kuo-Chao Chen