Tohoku University

Kunitoshi Tajima

Noriaki Matsunaga

Seiji Samukawa

Masaki Yoshimaru

Hisashi Yano

Shingo Kadomura

Tsutomu Shimayama

Shigeo Yasuhara

Disclosed is a low dielectric constant insulating film formed of a polymer containing Si atoms, O atoms, C atoms, and H atoms, which includes straight chain molecules in which a plurality of basic molecules with an SiO structure are linked in a straight chain, binder molecules with an SiO structure linking a plurality of the straight chain molecules. The area ratio of a signal indicating a linear type SiO structure is 49% or more, and the signal amount of the signal indicating Si(CH) is 66% or more.

Low dielectric constant insulating film and method for forming the same

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Kyoto, Japan

Kunitoshi Tajima