Canon Kabushiki Kaisha

Kunitaka Ozawa

Shunichi Uzawa

Noboru Koumura

Hidetoshi Suzuki

Ryuichi Ebinuma

Seiji Saito

Naoki Ayata

Hiroshi Kurosawa

Tetsuzo Mori

Katsunori Hatanaka

Takao Kariya

Koji Uda

Takashi Nakamura

Tetsuo Suzuki

Nobutoshi Mizusawa

Tadashi Shiina

Noriyasu Hasegawa

Eigo Kawakami

Eiji Sakamoto

Tsuneaki Kadosawa

Keiji Yoshimura

Eiji Koga

Masahiro Haruta

Noriyuki Nose

Isamu Shimoda

Mitsuaki Amemiya

Hironori Yamamoto

Makiko Mori

Junji Isohata

Makoto Miyazaki

Masakazu Ozawa

Hideki Yoshinari

Koichi Matsushita

Daisuke Itai

Hirohisa Ohta

Hitoshi Watanabe

Tomoaki Kawai

Satoshi Ogiwara

Takashi Hamamoto

Mitsuhiro Masuda

Hiroaki Fujiwara

Yoshihiro Kawauchi

Naoto Abe

Kenji Saitoh

Yukuo Nishimura

Shinichi Hara

Hiroshi Takagi

Tsuyoshi Eida

Kazunori Iwamoto

Takashi Noma

Toshiaki Asano

Makoto Higomura

Mitsunobu Nakazawa

Hisao Nakagawa

Kohji Uda

Koji Kazuma

Hajime Nakamura

Masa K Ozawa

Yutaka Tanaka

Kazuhiro Takahashi

Shigeyuki Suda

Makoto Takaoka

Shigeru Terashima

Shigeo Toganoh

Ryuichi Arai

Masanobu Hasegawa

Akira Katayama

Mitsutoshi Kuno

Youzou Fukagawa

Mitsuji Marumo

Hideyuki Chinju

Nobutoshi Mitzusawa

Ryuichi Ebinuna

An information processing apparatus for processing information generated by an exposure apparatus which exposes a substrate to radiant energy, comprises an information collecting unit configured to collect first apparatus information obtained by the exposure apparatus via an operation thereof with respect to each of a plurality of first regions which form a first array defined on the substrate, a converting unit configured to convert at least a part of the first apparatus information collected with respect to each of the plurality of first regions by the information collecting unit into second apparatus information with respect to each of a plurality of second regions which form a second array, a statistical processing unit configured to statistically process the second apparatus information, and an analyzing unit configured to analyze the statistical processing result obtained by the statistical processing unit.

Information processing apparatus, information processing method, and memory medium

An apparatus which transmits data generated by a device manufacturing apparatus to at least one terminal, comprises a communication unit, a transmission request processor configured to accept or reject a transmission request which the communication unit has received from the terminal, and a transmission controller configured to control the communication unit to transmit, in response to a transmission request accepted by the transmission request processor, data corresponding to the transmission request to a terminal, of the at least one terminal, which has transmitted the transmission request, wherein the transmission request processor accepts a new transmission request if a sum of transmission rates of the respective data concurrently transmitted from the communication unit in response to transmission requests which the transmission request processor has already accepted and a transmission rate at which data is transmitted in response to the new transmission request does not exceed a preset allowable transmission rate.

Information processing method and information processing apparatus for transmitting data generated by device manufacturing apparatus

An information processing apparatus, for processing information of a plurality of measured heights respectively corresponding to a plurality of measurement points on a surface of a substrate held by a chuck, includes a processor and an output device. The processor is configured to specify, with respect to the surface, a plurality of areas that are arrayed and a plurality of sections each constituted by a number of the plurality of areas, extract at least two inclinations of a plurality of inclinations respectively corresponding to the number of the plurality of areas based on the plurality of measured heights with respect to each of the plurality of sections, and cause the output device to output information specifying a section of the plurality of sections that satisfies a first condition that a product of two inclinations among the at least two inclinations exceeds a predetermined threshold.

Exposure apparatus and device manufacturing method

An information processing system using apparatus data recorded in a database in accordance with a data definition updated as needed, comprises a storage unit configured to store a data definition history that makes a data definition version and a period during which a data definition for the data definition version was used to correspond to each other, a data definition library in which the data definition version and the data definition for the data definition version are registered in correspondence with each other, and a detection unit configured to detect, from the data definition history, a data definition version of a data definition used in a period designated via a user interface, to detect a data definition for the detected data definition version from the data definition library, and to provide the detected data definition version and data definition to the user interface.

Information processing system, information processing method, and memory medium

An information processing system which utilizes apparatus data recorded in a database in conformity with a data definition which can be updated as needed, comprises a storage unit configured to store a data definition history in which a data definition version is associated with a period for which a data definition in the data definition version is used, a data definition library configured to register a data definition version and a data definition in the data definition version in association with each other, an extractor configured to extract, from the database, apparatus data which meets an extraction condition including an extraction period designated via a user interface, and a converter configured to convert an expression of the apparatus data extracted by the extractor into an expression conforming to a data definition designated via the user interface.

Information processing system, information processing method, and computer-readable storage medium

An exposure apparatus includes an illumination system for illuminating, with pulse light, a reticle having a pattern formed thereon, a reticle stage for scanning the reticle, a projection system for projecting the pattern onto a wafer, a wafer stage for scanning the wafer, an interface into which information related to the reticle is inputted and a controller for changing illumination conditions on the basis of the information inputted to the interface. The reticle is illuminated with the pulse light while the reticle and the wafer are scanned, by which the pattern of the reticle is transferred to the wafer sequentially.

An exposure apparatus includes a light source for providing pulse light, a mask scanner for scanning a mask having a pattern, a wafer scanner for projecting a wafer onto which the pattern is to be projected and a light emission period determining device. The mask scanner and the wafer scanner scan the mask and the wafer in a timed relation so that the mask is illuminated while superposing portions of an illumination region defined by the pulse light and being narrower than the pattern such that the pattern is lithographically transferred onto the wafer. The light emission period determining device determines a period of emission of the pulse light, prior to an actual exposure process, wherein the emission period can be changed in accordance with a required precision of an integrated exposure amount.

An illumination system includes a light source for providing pulse light, and a scanning system for relatively and scanningly moving an article, to be illuminated, relative to an illumination region to be defined by the pulse light, wherein, in a light intensity distribution defined in the illumination region with respect to a scan direction, the light intensity changes non-linearly from an least one end portion to a highest light intensity point in the distribution, wherein the light intensity distribution includes a first point at the one end portion, a second point whereat light intensity increase changes, a third point whereat light intensity increase changes, and a fourth point whereat the light intensity is highest, and wherein at least one of a width Wa between the first and second points and a width Wb between the third and fourth points substantially corresponds to or is greater than the relative movement amount between the illumination region and the article per pulse.

Illumination system and scan type exposure apparatus

An alignment method useable with an original having a pattern and a substrate having a surface area on which the pattern of the original is printed. The alignment method comprises detecting plural marks, calculating plural times, the amount of rotational deviation on the basis of different combinations of marks, calculating the quantity of rotational correction of the original and the substrate by using the computed rotational deviations, and aligning on the basis of the calculated quantity of the rotational deviation.

Alignment system

A recording apparatus having a memory for storing recording data, and an address counter for controlling addresses in the memory in the direction of the columns or rows. The address counter controls a read start address for starting a process of reading the memory, thereby compensating for deviations in the longitudinal or widthwise direction of recording paper.

Printer apparatus

An exposure apparatus and device manufacturing method having structure and steps for projecting, for scan exposure of a substrate through an original, a plurality of light pulses from a pulse light source to the substrate through the original, changing an emitted light intensity of light pulses from the pulse light source during the scan exposure, and changing timing of light emission from the pulse light source during the scan exposure, whereby both the emitted light intensity and the timing of light pulses may be controlled during the scan exposure.

Exposure apparatus and method using pulsed light and changing means to

An exposure apparatus includes a mask scanning device for scanning a mask on which a pattern is formed, a projection optical system for projecting the pattern on the mask onto a wafer, a wafer scanning device for scanning the wafer, onto which the pattern is projected by the projection optical system, an illuminating device for illuminating the mask in an illumination area narrower than the pattern by synchronously scanning the mask and the wafer relative to each other, using the mask scanning device and the wafer scanning device, so as to expose and transfer the pattern on the wafer, a detection device for detecting information regarding exposure before exposing and transferring the pattern onto the wafer by the illuminating device and for producing detection results, and a display for displaying exposure information obtained from the detection results. Also disclosed are methods of manufacturing semiconductor devices, for example, using such an exposure apparatus.

Exposure apparatus and method of manufacturing a device using the same

A scanning projection exposure apparatus includes an illumination optical system for illuminating an original with pulse light, a projection optical system for projecting a pattern of the original, illuminated with the pulse light, onto a substrate, a moving device for moving the original and the substrate relative to each other, a position measuring device for measuring a relative positional relation between the original and the substrate, and a controller for discriminating whether the positional relation measured by the position measuring device is in a predetermined range. The discrimination is performed within a period after the moving device initiates the relative movement of the original and the substrate and before the illumination optical system initiates the projection exposure with the pulse light. The controller stops the projection exposure with the pulse light from the illumination optical system when the positional relation is discriminated as being out of a predetermined range.

Scanning projection exposure method and apparatus

A synchrotron exposure includes a synchrotron radiation source for generating a synchrotron radiation beam, and exposure unit having a mask stage for holding a mask and a wafer stage for holding a waver, a beam port for directing the radiation beam to the exposure unit, a mirror unit having a mirror for reflecting the radiation beam, a pre-alignment system for aligning the wafer relative to the wafer stage, a fine-alignment system for aligning the wafer held by the wafer stage relative to the mask held by the mask stage, a mask storage apparatus for storing the mask, a wafer storage apparatus for storing the wafer, a mask conveying apparatus for conveying the mask between the mask storage apparatus and the mask stage and a wafer conveying apparatus for conveying a wafer between the wafer storage apparatus and the wafer stage.

Alignment apparatus and SOR X-ray exposure apparatus having same

A method of controlling a stage includes the steps of setting a plurality of drive modes according to which the stage is driven, which correspond to a plurality of positioning processes for positioning an element supported by the stage, and driving the stage according to the plurality of drive modes corresponding to the plurality of positioning processes. An exposure apparatus employing such a method includes a stage mechanism on which a substrate is placed, an exposure device for exposing the substrate to light, a memory for storing data representing a plurality of drive modes according to which the stage mechanism is driven for positioning the substrate, a driver for driving the stage mechanism in accordance with the drive modes, and a controller for selecting one of the drive modes stored in the memory in accordance with a positioning process according to which the substrate is to be positioned, and for controlling the driver in accordance with the selected drive mode.

Method of controlling a stage and a system such as an exposing apparatus

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Isehara, Japan

Kunitaka Ozawa