Sumitomo Chemical Company, Limited

Kunishige Edamatsu

Takayuki Miyagawa

Kazuhiko Hashimoto

Yuji Yoshida

Haruyoshi Osaki

Yoshiyuki Takata

Akira Kamabuchi

Junji Shigematsu

The present invention provides a chemically amplified resist composition comprising: wherein Rrepresents a hydrogen atom or a methyl group, ring Xrepresents an unsubstituted or substituted C3-C30 cyclic hydrocarbon group having &#x2014;COO&#x2014; and k represents an integer of 1 to 4, wherein Rrepresents a hydrogen atom, a methyl group or a trifluoromethyl group, and

Chemically amplified positive resist composition

The present invention provides a chemically amplified resist composition comprising a resin which comprises a structural unit having an acid-labile group and a structural unit represented by the formula (I): wherein Rrepresents a hydrogen atom or a methyl group, ring X represents a C3-C30 cyclic hydrocarbon group in which one &#x2014;CH&#x2014; is substituted with &#x2014;COO&#x2014;, and at least one hydrogen atom in the C3-C30 cyclic hydrocarbon group may be substituted, and p represents an integer of 1 to 4, and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, anda salt represented by the formula (II): wherein Yand Yeach independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, Arepresents an organic counter ion, and Rrepresents a C1-C30 hydrocarbon group which may be substituted and at least one &#x2014;CH&#x2014; in the C1-C30 hydrocarbon group may be substituted with &#x2014;CO&#x2014; or &#x2014;O&#x2014;.

Chemically amplified resist composition

A positive resist composition sensitive to radiations such as ultraviolet rays, far ultraviolet rays, which comprises;

Positive resist composition

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Toyonaka, Japan

Kunishige Edamatsu