Asahi Glass Company, Limited

Hitachi, Ltd.

Honda Motor Co., Ltd.

Corrpro Companies, Inc.

Shinwa Frontech Corp.

Asahi Glass Company, Linited

Kunio Watanabe

Takashi Okazoe

Masahiro Ito

Daisuke Shirakawa

Shin Tatematsu

Eisuke Murotani

Koichi Yanase

Shu-zhong Wang

Hidekazu Okamoto

Hirokazu Takagi

Kimiaki Kashiwagi

Kazuya Oharu

Isamu Kaneko

Hidenobu Murofushi

Yukari Nagashige

Shinichi Kojima

Satoshi Kawaguchi

Shoichi Miyazawa

Yu Takeuchi

Chikaya Tamitsuji

Yasuhiro Suzuki

Kouji Shida

Hiroshi Kimura

Taiki Hoshino

Ryutaro Horita

Takashi Nara

Kenichi Hase

Daisuke Kobayashi

Akio Koike

Atsushi Watakabe

Masao Iwaya

Takeshi Eriguchi

Yoshiteru Ishida

Masakuni Sato

Makoto Honda

Tomoyuki Fujita

Koji Nakagawa

Keigo Matsuura

Soichi Isono

Yasuto Watanabe

Hiroshi Funaki

Yasuo Hayashi

Tomonori Ogawa

Naoki Okahata

Hiroyuki Fujita

Makoto Fukawa

Kaname Okada

Shiro Tanii

Hiroshi Yamamoto

Kazuhiko Yamanaka

Shingo Nomura

Nobuaki Ikawa

Kazuyoshi Kurashima

Masanobu Shirai

Ryosuke Kato

Satoshi Miyasaka

Gen Ogawa

Junichi Miyashita

Hideko Nakada

Toshifumi Nihei

Shozo Takeya

Kouzi Shida

Ng Soon Yeng

A glass sheet has one surface and the other surface facing the one surface in a thickness direction, wherein a fluorine concentration (average fluorine concentration by SIMS at a depth of 1 to 24 &#x3bc;m) in the one surface is higher than that in the other surface. The following expression is satisfied: 0.07&#x2266;&#x394;F/&#x394;HO. &#x394;F (mol %) is a value obtained by subtracting an average fluorine concentration in the surface having the lower fluorine concentration from that in the surface having the higher fluorine concentration, and &#x394;HO (mol %) is an absolute value of a value obtained by subtracting an average HO concentration in the surface having the higher fluorine concentration from that in the surface having the lower fluorine concentration.

Glass sheet capable of being inhibited from warping through chemical strengthening

To provide a method for purifying R-1234yf, whereby it is possible to efficiently remove even impurities such as R-1243zf, etc. which are difficult to separate by distillation purification, from a mixture containing R-1234yf as the main component and various impurities, such as a gas formed by reacting R-1214ya with hydrogen. The method for purifying R-1234yf comprises a step of bringing a mixture which contains R-1234yf as the main component and also contains hydrohaloalkene impurities other than R-1234yf and hydrohaloalkane impurities, into contact with a solvent that has an extraction/removal index (r), as represented by the formula r=[4&#xd7;(&#x3b4;D&#x2212;17.2)+(&#x3b4;P&#x2212;8.3)+(&#x3b4;H&#x2212;2.6)], of at most 6.5, so as to remove at least a part of the hydrohaloalkene impurities and hydrohaloalkane impurities.

Method for purifying 2,3,3,3-tetrafluoropropene

A fluorinated elastic copolymer which has iodine atoms, bromine atoms, or both iodine and bromine atoms, at its molecular terminals and which includes repeating units (a) based on tetrafluoroethylene, repeating units (b) based on a fluorinated monomer having one polymerizable unsaturated bond (provided that tetrafluoroethylene is excluded), and repeating units (c) based on a fluorinated monomer having at least two polymerizable unsaturated bonds, wherein the ratio (molar ratio) of the repeating units (a) to the repeating units (b) is (a)/(b)=40/60 to 90/10, and the proportion of the repeating units (c) based on the total amount of the repeating units (a) and the repeating units (b) is from 0.01 to 1 mol %.

Fluorinated elastic copolymer and process for its production, and crosslinked rubber article

In the production of 2,3,3,3-tetrafluoropropene (HFO-1234yf), formation of HFC-254eb as an excessively reduced product is suppressed. A process for producing 2,3,3,3-tetrafluoropropene, which comprises reacting a raw material compound gas composed of at least one of 1,1-dichloro-2,3,3,3-tetrafluoropropene and 1-chloro-2,3,3,3-tetrafluoropropene, and hydrogen gas, in the presence of a catalyst, wherein the catalyst is a catalyst having palladium supported on active carbon, and the ratio of the number of moles of the hydrogen gas to the number of moles of chlorine atoms in the raw material compound gas (H/Cl) is at most 0.7.

Process for producing 2,3,3,3-tetrafluoropropene

The present invention relates to an optical member including a TiO-containing silica glass having: a TiOconcentration of from 3 to 10% by mass; a Ticoncentration of 100 wt ppm or less; a thermal expansion coefficient at from 0 to 100&#xb0; C., CTE, of 0&#xb1;150 ppb/&#xb0; C.; and an internal transmittance in the wavelength range of 400 to 700 nm per a thickness of 1 mm, T, of 80% or more, in which the optical member has a ratio of variation of Ticoncentration to an average value of the Ticoncentration, &#x394;Ti/Ti, on an optical use surface, is 0.2 or less.

[object Object]

To provide a novel fluorination treatment method whereby the surface of oxide glass can be treated for fluorination at low cost and with excellent adhesiveness. A method for treating the surface of oxide glass, which comprises contacting the surface of oxide glass with a gas of a fluorinating agent or a mixed gas having a fluorinating agent diluted with an inert gas, wherein the fluorinating agent is an elemental fluorine, or a fluorine compound capable of cleaving a bond between an oxygen atom and a metal atom in the framework of the oxide glass and forming a bond between a fluorine atom and the metal atom; and the concentration of hydrogen fluoride at the surface of oxide glass with which the fluorinating agent is in contact, is controlled to be at most 1 mol %.

Method for treating surface of oxide glass with fluorinating agent

The object is to provide a process for producing highly pure 2,3,3,3-tetrafluoropropene, whereby formation of 3,3,3-trifluoropropene is suppressed. A process for producing 2,3,3,3-tetrafluoropropene, which comprises reacting a raw material compound composed of 1,1-dichloro-2,3,3,3-tetrafluoropropene and/or 1-chloro-2,3,3,3-tetrafluoropropene, and hydrogen in a gas phase in a reactor having a catalyst layer packed with a catalyst-supporting carrier, while maintaining the maximum temperature of the catalyst layer to be at most 130&#xb0; C., to obtain formed gas containing 2,3,3,3-tetrafluoropropene, and then, contacting the formed gas discharged from the reactor, with alkali at a temperature of at most 100&#xb0; C.

The object is to provide a process whereby it is possible to produce 2,3,3,3-tetrafluoropropene at a high conversion ratio constantly for a long period of time. A process for producing 2,3,3,3-tetrafluoropropene, which comprises reacting a raw material compound of at least one of 1,1-dichloro-2,3,3,3-tetrafluoropropene and 1-chloro-2,3,3,3-tetrafluoropropene, and hydrogen, in the presence of a noble metal catalyst supported on active carbon having an ash content of at most 3% as measured in accordance with ASTM D2866.

Obtaining a crosslinked rubber with high flexibility at low temperature includes crosslinking a fluororubber composition. The fluororubber composition includes a fluororubber and a compound of formula (X&#x2014;)(Z&#x2014;)Y. In the formula, X is U&#x2014;(CF)O(CFCFO)&#x2014;; Z is RO(CFCFO)&#x2014;; Y is a (x+z) valent perfluoro saturated hydrocarbon group, optionally interrupted by an etheric oxygen atom; x is an integer of at least 3; z is an integer of at least 0; U is a monovalent group with an unsaturated hydrocarbon, a bromine atom, an iodine atom, or a combination thereof; Ris a Clinear perfluoroalkyl group, optionally interrupted by an etheric oxygen atom; a is an integer of from 0 to 20; b is an integer of from 1 to 200; and c is an integer of from 3 to 200.

Crosslinkable fluororubber composition and crosslinked rubber article

The object is to provide a process for producing highly pure 2,3,3,3-tetrafluoropropene, whereby formation of 3,3,3-trifluoropropene as a by-product is suppressed. A process for producing 2,3,3,3-tetrafluoropropene, which comprises introducing and reacting a raw material compound composed of at least one of 1,1-dichloro-2,3,3,3-tetrafluoropropene and 1-chloro-2,3,3,3-tetrafluoropropene, and hydrogen, in a catalyst layer packed with a catalyst-supporting carrier, wherein the temperature of the catalyst layer is controlled to be higher than the dew point of the raw material mixed gas comprising the raw material compound and the hydrogen, and the maximum temperature of the catalyst layer is maintained to be at most 130&#xb0; C. during the reaction.

The present invention relates to a process for production of a synthetic quartz glass having a fluorine concentration of 1,000 mass ppm or more, the process comprising: (a) a step of depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass forming raw material onto a substrate, to thereby form a porous glass body; (b) a step of keeping the porous glass body in a reaction vessel that is filled with elemental fluorine (F) or a mixed gas comprising elemental fluorine (F) diluted with an inert gas and contains a solid metal fluoride, to thereby obtain a fluorine-containing porous glass body; and (c) a step of heating the fluorine-containing porous glass body to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body.

Process for production of synthetic quartz glass

A circuit board and a method of manufacturing the same are provided. The circuit board includes: a multilayer board in which a plurality of conductive layers with desired patterns formed therein, and a plurality of insulating layers are stacked; a plurality of through holes penetrating the multilayer board; cylindrical recesses each formed around a through hole corresponding thereto, having a diameter larger than that of the through hole, having a depth from an outermost surface of the insulating layer to a surface of the conductive layer for electrical connection, and partially exposing the surface of the predetermined conductive layer; and a plurality of conductive terminals fitted into the through holes.

Circuit board and method of manufacturing the same

The present invention is to provide a synthetic quartz glass body having a high light transmittance. The present invention provides a synthetic quartz glass body having pores in a surface part thereof.

Synthetic quartz glass body, process for producing the same, optical element, and optical apparatus

The present invention provides a process whereby fluorine atom-containing sulfonyl fluoride compound(s) useful as e.g. materials for ion-exchange membranes, can be produced efficiently and at low cost without structural limitations while solving the difficulties in production. Namely, the present invention provides a process which comprises reacting XSOR-E(1) with R-E(2) to form XSOR-E-R(3), then reacting (3) with fluorine in a liquid phase to form FSOR-E-R(4), and further, decomposing the compound to obtain FSO-E(5), wherein Ris a bivalent organic group, Eis a monovalent reactive group, Ris a monovalent organic group, Eis a monovalent reactive group which is reactive with E, E is a bivalent connecting group formed by the reaction of Ewith E, Ris a bivalent organic group formed by the fluorination of R, etc., Ris the same group as R, etc., Eis a bivalent connecting group formed by the fluorination of E, etc., Eis a monovalent group formed by the decomposition of E, and X is a halogen atom.

Process for producing a fluorine atom-containing sulfonyl fluoride compound

The present invention provides a process whereby fluorine atom-containing sulfonyl fluoride compound(s) useful as e.g. materials for ion-exchange membranes, can be produced efficiently and at low cost without structural limitations while solving the difficulties in production. Namely, the present invention provides a process which comprises reacting XSOR-E(1) with R-E(2) to form XSOR-E-R(3), then reacting (3) with fluorine in a liquid phase to form FSOR-E-R(4), and further, decomposing the compound to obtain FSOR-E(5), wherein Ris a bivalent organic group, Eis a monovalent reactive group, Ris a monovalent organic group, Eis a monovalent reactive group which is reactive with E, E is a bivalent connecting group formed by the reaction of Ewith E, Ris a bivalent organic group formed by the fluorination of R, etc., Ris the same group as R, etc., Eis a bivalent connecting group formed by the fluorination of E, etc., Eis a monovalent group formed by the decomposition of E, and X is a halogen atom.

Growing community of inventors

Yokohama, Japan

Kunio Watanabe