Showa Denko K.k.

Showa Denko Kabushiki Kaisha

Kunio Matsuki

Shigeru Kurosawa

Satoshi Saito

Katsuji Yano

Masahiro Amemiya

An object of the present invention is to provide a new cleaning agent composition having excellent cleaning power for the surface contamination of a semiconductor wafer or various precisely worked instruments made of glass or ceramic, which is used in the manufacture of wafer; a method for cleaning a wafer; a semiconductor wafer having a surface cleaned by a cleaning method; and a method for manufacturing a semiconductor wafer. A semiconductor wafer is cleaned using a cleaning agent composition including a specific fluorine-containing anionic surfactant, a quaternary ammonium hydroxide and/or an alkanolamine.

Cleaning agent composition, method for cleaning and use thereof

Polyether sulfone imide copolymers having excellent mechanical strength, heat resistance and heat aging resistance and enhanced processability are disclosed, which are composed of recurring units of the following formulae (I) and (II) ##STR1## wherein Ar.sup.1 represents a residue of a dihydric phenol, Ar.sup.2 represents a residue of an aminophenol, and Ar.sup.3 represents a residue of an aromatic tetracarboxylic acid.

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Kanagawa, Japan

Kunio Matsuki