Nikon Corporation

Kunihiro Kawae

Manabu Toguchi

Tadaaki Shinozaki

Kazuo Murano

A method of measuring the orthogonality of a movement coordinate system of a stage unit having a stage which two-dimensionally moves along the movement coordinate system determined by first and second axes that cross each other, by mounting a measurement substrate having at least three measurement patterns on the stage, the at least three measurement patterns including at least two first patterns arranged on a line parallel to a third axis on an array coordinate system determined by the third and fourth axes crossing each other, and at least two second patterns arranged on a line parallel to the fourth axis; aligning the third axis with respect to the first axis of the movement coordinate system; obtaining a difference in an angle between the fourth axis of the array coordinate system and the second axis of the movement coordinate system as a first deviation by detecting the positions of the second patterns on the movement coordinate system in an aligned state; rotating the measurement substrate by 90 degrees from the aligned state and mounting the measurement substrate on the stage; aligning the fourth axis with respect to the first axis of the movement coordinate system; obtaining a difference in an angle between the third axis of the array coordinate system and the second axis of the movement coordinate system as a second deviation by detecting the positions of the first patterns on the movement coordinate system in the aligned state; and obtaining the orthogonality of the movement coordinate system on the basis of the first and second deviations.

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Machida, Japan

Kunihiro Kawae