Agency of Industrial Science and Technology

Ministry of International Trade & Industry

Other

Sekisui Chemical Co., Ltd.

Nippon Kayaku Kabushiki Kaisha

Toda Kogyo Corporation

Toyo Gosei Kogyo Co., Ltd.

Sony Corporation

Ajinomoto Co., Ltd.

National Institute of Advanced Industrial Science and Technology

Hitachi Chemical Company, Ltd.

Director-general of Agency of Industrial Science and Technology

Agency of Industrial Science and Technology Ministry of International

Director-general of the Agency of Industrial Science and Technology

Murakami Co., Ltd.

Kunihiro Ichimura

Takashi Tamaki

Hiroji Fukui

Daisaku Matsunaga

Hideo Kikuchi

Takahiro Seki

Masako Sakuragi

Kenichi Aoki

Yasunori Uetani

Kazuyuki Hayashi

Hiroko Morii

Hiroshi Kobayashi

Masaru Uryu

Kunihiko Watanabe

Yasuo Miyadera

Eiichi Kurita

Nobuo Miyadera

Shigeru Yamanaka

Masumi Suetsugu

Hideaki Ishizawa

Noriaki Tochizawa

Yoshio Nishi

Iwao Fukuchi

Katsuhiko Namba

Minoru Suezaki

Naoto Ohta

Yasuzo Suzuki

Toshio Enami

Yutaka Honda

Junji Toda

Masatoshi Iguchi

Takao Unate

Keiichi Hayashi

Masahide Ueda

Motoi Nagano

Junichi Kawanobe

Koso Aoki

Chieko Hotta

Akira Hosoki

Eri Nagabuchi

Teruhiko Yonezawa

Nariaki Tochizawa

Masanori Hashimoto

Tetsuro Suehiro, Deceased

Christian Ruslim

Mitsuhiro Ikeda

Yuji Kawanishi

Norio Ishizuki

Perminder Singh Johar

Shigenobu Mitsuhashi

Tsugio Okudaira

Daisaku Murakami Co Ltd Adachi

Tomoyuki Murakami Co Ltd Morita

Junichi Murakami Co Ltd Kawanobe

Kazuo Murakami Co Ltd Inoue

A process for producing a film pattern, in which a layer of photosensitive resin composition is formed on a substrate and exposed selectively through a mask to light to thereby obtain a film pattern provided on its surface with protrusions and depressions without the need to remove the layer of photosensitive resin composition at unexposed regions or exposed regions by, for example, development; and a photosensitive resin composition for use in the above process for producing a film pattern. There is provided a process for producing a patterned film, comprising the steps of preparing a photosensitive resin composition that upon light irradiation, generates an acid or a base and is hardened; coating substrate () with the photosensitive resin composition to thereby form photosensitive resin composition layer () of given thickness; and exposing the photosensitive resin composition layer () selectively through mask () to light so as to travel at least portion of the photosensitive resin composition at unexposed regions toward the exposed regions and further effect hardening thereof, thereby obtaining patterned film (A) furnished on its surface with protrusion/depression pattern.

Process for producing patterned film and photosensitive resin composition

This invention relates to a photosensitive composition characterized by comprising components A, B and C, and a photosensitive film and a stencil for screen printing using the photosensitive composition; Component A: a poly(vinyl alcohol) polymer represented by formula (1) or (2) wherein Rrepresents a hydrogen atom, an alkyl or aralkyl group having 1 to 10 carbon atoms, wherein the alkyl and aralkyl groups may be substituted by a hydroxyl or carbamoyl group and the bond between carbon atoms thereof may be present through an oxygen atom or an unsaturated bond; Rrepresents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms; m is an integer of 1 to 6; n is 0 or 1; and Xrepresents a halogen ion, a phosphate ion, a methosulfate ion, or a sulfonate ion, or a mixture of the anions; component B: a radical polymerizable monomer containing at least one ethylenically unsaturated bond and possesses an anion dissociating capability; and component C: a radical photoinitiator.

Photosensitive resin composition, and photosensitive film and stencil for screen printing using the photosensitive composition

The present invention relates to a micropattern retardation element requiring no stretch processing and no extremely high positioning accuracy in cutting films, and the like, and having the retardation region controlled in width of a micron unit, and a producing method therefore. Said micropattern retardation element can be obtained by forming a liquid crystalline or non liquid crystalline polymer thin film layer having photoactive groups, on a substrate, and then, after orientation treatment in a micropattern form, forming a birefringence layer so as to contact with said polymer thin film layer, so that birefringence molecules of said birefringence layer are oriented according to orientation of photoactive groups in said thin film. Said retardation element is used in a three-dimensional display, and the like.

Micropattern retardation element

To provide such a base multiplying agent capable of being used for crosslinking reaction, for example of a epoxy compound and the like, that generates another base by action of a base, and can efficiently perform base multiplying reaction, and a base-reactive curable composition using the base multiplying agent. The base generating agent of the invention is represented by the following formula (1): (In the formula (1), X represents a hydrogen atom, a substituted alkyl group or an unsubstituted alkyl group; Y represents a substituted or unsubstituted alkylene chain; and n represents an integer of from 1 to 4.)

Base multiplying agents and base-reactive curable compositions

The transparent coloring composition comprises a solvent and an organic-inorganic composite pigment comprising (i) fine white inorganic particles and an organic pigment adhered to the surface of the respective fine white inorganic particles, or (ii) fine white inorganic particles, a surface modifier coated on the surface of the respective fine white inorganic particles and an organic pigment adhered onto the surface modifier coating layer, primary particles of the composite pigment having an average particle diameter of 1 to 100 nm. The transparent coloring composition for color filter comprises the above transparent coloring composition and a transparent resin containing at least one acid group and/or latent acid group. The color filter is produced by applying a film-forming material made of the above transparent coloring composition for color filter on a substrate. The transparent coloring composition is suitable as a coloring composition for color filter because of excellent dispersibility and spectral properties. Further, the color filter produced from the transparent coloring composition can be suitably used as color filters for color liquid crystal displays (LCD) or the like owing to the excellent spectral properties.

Transparent coloring composition and color filter

Chemical amplification type positive resist composition

A polarized element formed by arranging a dichroic molecule in a micropattern form on a thin film layer of a liquid crystalline resin having a photoactive group irradiated by a linearly polarized light. The micropattern polarized element can be produced without need of a very high position-matching precision as sticking.

Micropattern polarized element

Liquid-crystal alignment film

Polarizing element, polarizing plate, and process for production thereof

The disclosure describes a surface reforming agent comprising a cone-type calix �4! resorcinarene compound represented by the formula (I): ##STR1## wherein R is an alkyl group having 3 to 18 carbon atoms, an alkenyl group having 3 to 18 carbon atoms, an aralkyl group having 3 to 18 carbon atoms or a substituted or non-substituted aryl group; R.sup.1 is a hydrogen atom, a carboxyalkyl group in which the alkyl group has 1 to 3 carbon atoms, or a hydroxyalkyl group having 2 to 4 carbon atoms.

Surface reforming agent, surface reforming method and cone-type calix �4! r

A photorecording element consists essentially of a transparent substrate, a layer of a macromolecular compound capable of undergoing a reversible change in structure upon exposure to light, deposited by adsorption on the transparent substrate, and a liquid crystal layer disposed directly on the layer of macromolecular compound. A method for the production of the photorecording element comprises applying on a transparent substrate a mixture of a liquid crystal substance with a macromolecular compound capable of undergoing a reversible change in structure upon exposure to light and allowing the applied layer of the mixture to stand at rest or by first applying the macromolecular compound on the transparent substrate and then adding the liquid crystal substance thereto. A liquid crystal cell incorporating the photorecording element is also disclosed.

Photorecording element, method for production thereof, and the liquid

Enzyme-occluding polymer particles are produced by a method including the steps of dissolving an enzyme in an aqueous solution of poly(vinyl alcohol) possessing a styrylpyridinium group or a styrylquinolinium group, spray drying the aqueous solution, and exposing the resultant dry particles to an actinic ray, thereby photo-crosslinking the particles.

Enzyme immobilized by spray-drying and photocrosslinking a poly(vinyl

A photosensitive poly(vinyl alcohol) derivative comprising units of the fula ##STR1## wherein R.sub.1 is alkylene, R.sub.2 is hydrogen or a lower alkoxy, ##STR2## is a quaternary aromatic nitrogen-containing heterocycle, X.sup.- is SO.sub.3.sup.- or CO.sub.2.sup.-, m is 0 or 1, and n is an integer of 1 to 6 capable of being developed with an aqueous developing solution.

Photosensitive poly(vinyl alcohol) derivative

A photorecording element is disclosed which consists of a transparent substrate, a molecular layer of an organic compound with an ability to change structure reversibly by virtue of light and disposed in direct contact with the transparent substrate, and a layer of liquid crystals disposed in direct contact with the molecular layer. A liquid crystal cell comprising the photorecording element is also disclosed. A modification having fine deformations on the surface of the transparent substrate and a modification having a dichroic dye contained in the layer of liquid crystals are embraced by the present invention.

Photorecording element and liquid crystal cell comprising the same

The invention provides a novel contrast-enhancing agent for photolithography which is used as an overcoating on a positive-working photoresist layer for enhancing the contrast of the photoresist in a low-contrast exposure to light. The composition comprises, in addition to a watersoluble polymer, e.g., poly(vinyl alcohol), poly(vinyl pyrroilidone) and pullulan, as the binder, a specific photo-bleachable organic compound having, in a molecule, at least one nitrogen-containing heterocyclic aromatic structure represented by the general formula ##STR1## in which Z is a divalent group to form the heterocyclic aromatic ring with the nitrogen atom, X is an anionic group of monovalency and n is a positive integer of, e.g., 1 or 2.

Contrast-enhancing agent for photolithography

Growing community of inventors

Yokohama, Japan

Kunihiro Ichimura