Asahi Glass Company, Limited

Dohkai Chemical Industry Co., Ltd.

Kokusai Electric Co., Ltd.

Kunihiko Terase

Kimihiko Sato

Masaharu Tanaka

Hitoshi Kijimuta

Hiroo Mori

Hachirou Hirano

Masaki Inoue

Makoto Senoue

Eiichi Ono

Takayoshi Sasaki

Hiroshi Funaki

Keiichi Nakaya

Hideo Komatsu

Yasuhiro Sanada

Shinya Iida

Suekazu Hirata

Yukinori Ohta

Kouichi Yokoyama

Michiomi Nagase

Atsunari Fujii

Sadao Hagita

A floor polishing composition containing a film-formable organic high molecular material as the main component, which further contains at least scaly particles.

Floor polishing composition

A silica-metal oxide particulate composite comprising silica agglomerates having voids formed by random stacking of scaly silica primary particles, and metal oxide particulates supported on the surfaces, and the inner surfaces in the voids, of the silica agglomerates.

Silica-metal oxide particulate composite and method for producing silica

An alumina sol having an alumina solid content of at least 10 wt % and a viscosity of not higher than 5 Pa.s measured by a Brookfield viscometer and containing a cation other than a hydrogen ion in a total ion equivalent concentration in the range of from 2.0.times.10.sup.-4 to 1.0.times.10.sup.-1 N and a method of preparing the same.

High concentration alumina sol of low viscosity

A process for producing zinc oxide-containing spherical silica, which comprises emulsifying, in an organic solvent containing a surfactant, a dispersion having zinc oxide with a particle size of from 0.005 to 0.5 .mu.m dispersed in an aqueous alkali metal silicate solution in an amount of from 10 to 70 wt % based on the total amount of zinc oxide and SiO.sub.2 in the aqueous alkali metal silicate solution, followed by gelation of the resulting emulsion with carbon dioxide gas.

Zinc oxide-containing spherical silica and process for its production

A process for preparing hydrogen fluoride, which comprises (i) reacting calcium fluoride with sulfuric acid to produce a gypsum and a gas containing hydrogen fluoride, (ii) separating hydrogen fluoride from said gas containing hydrogen fluoride, (iii) absorbing said hydrogen fluoride-separated gas with water to obtain an aqueous solution containing hydrogen fluoride and silicofluoric acid, (iv) reacting calcium carbonate with said aqueous solution to obtain a suspension containing silicic acid and calcium fluoride, (v) adding an alkaline substance to said suspension to make pH at least 8, thereby stabilizing the silicic acid as a colloidal solution, (vi) separating a calcium fluoride solid and the colloidal solution of silicic acid from said suspension, and (vii) recycling the separated calcium fluoride as a starting calcium fluoride.

Process for preparing hydrogen fluoride

A method for treating a waste gas containing a fluorine component and/or a chlorine component, which comprises contacting the waste gas with magnesium oxide particles having a specific surface area of from 100 to 200 m.sup.2 /g.

Method for treating a waste gas

A dry-etching process comprising dry-etching treatment of semiconductor material by action of a gas and, if necessary, cleaning treatment, characterized in that at least one of the dry-etching and cleaning treatments is conducted under action of a gas composed essentially of a fluorinated ether.

Dry-etching process

A method for synthesizing amorphous silicon nitride, wherein silicon halide and ammonia are reacted in a reaction vessel at a high temperature in the absence of oxygen to thereby synthesize powder of amorphous silicon nitride, then the powder is separated from a gas containing therein gaseous ammonia halide which has been produced simultaneously with said amorphous silicon nitride by use of a collecting means, comprises directly mixing, in advance of the separation, cool gas containing therein neither oxygen nor moisture into said gas to cool down said powder and gas so that both substances may be put in said collecting means without deposition of ammonium halide to the inner wall of the reaction vessel, and other component parts.

Method for synthesizing amorphous silicon nitride

A process for synthesizing silicon nitride by reacting a silicon halide and ammonia at a high temperature, which is characterized in that at least while the reaction product is amorphous, hydrogen and chlorine are burned in the reaction zone where a halogen containing inorganic silicon compound and ammonia are reacting, and the reaction of said reactants is effected by the heat of combustion thus obtained.

Growing community of inventors

Ichihara, Japan

Kunihiko Terase