Iwatani Corporation

Tokyo Electron Limited

Iwatani Sangyo Kabushiki Kaisha (iwatani International Corporation)

Sharp Kabushiki Kaisha Corporation

Central Glass Company, Limited

Kyoto University

National Cerebral and Cardiovascular Center

Sofsera Corporation

Kunihiko Koike

Koichi Izumi

Yu Yoshino

Goichi Inoue

Takehiko Senoo

Naohisa Makihira

Sadaki Nakamura

Takehiko Orii

Kazuya Dobashi

Yukimasa Saito

Tadashi Shojo

Masami Nakagawa

Keita Kanehira

Jiro Matsuo

Toshio Seki

Tsutomu Furuzono

Yasumichi Kogai

Norikazu Hohshi

Toshiki Manabe

Toshihiro Aida

Masahiro Tainaka

Manabu Saeda

Tomoya Biro

Takashi Minamihonoki

Shuhei Azuma

Satoshi Ninomiya

Shigenori Takatori

Tatsuo Fukuda

Hiroshi Ichimaru

There is provided a gas cluster processing device for performing a predetermined process on a workpiece by irradiating the workpiece with a gas cluster, including: a processing container in which the workpiece is disposed; a gas supply part configured to supply a gas for generating the gas cluster; a flow rate controller configured to control a flow rate of the gas supplied from the gas supply part; a cluster nozzle configured to receive the gas for generating the gas cluster at a predetermined supply pressure, spray the gas into the processing container maintained in a vacuum state, and convert the gas into the gas cluster through an adiabatic expansion; and a pressure control part provided in a pipe between the flow rate controller and the cluster nozzle and including a back pressure controller configured to control a supply pressure of the gas for generating the gas cluster.

Gas cluster processing device and gas cluster processing method

A method and apparatus, for supplying high-pressure mixed gas of a low-vapor-pressure first gas as an active gas and a high-vapor-pressure second gas, are arranged to reduce an amount of the first gas discarded. The mixed gas in a high-pressure state is supplied from a mixing container to a use point. Upon reduction of pressure in the mixing container to a setpoint as a result of supply to the use point, a predetermined amount of the first gas is charged into a replenishment container connected to the mixing container by a replenishment line having a replenishment valve, and which is evacuated. As the second gas is charged into the replenishment container charged with the first gas, the replenishment valve is opened such that the first gas in the replenishment container is forced out by the second gas, thereby charging the mixing container with the mixed gas in the high-pressure condition.

Method and apparatus for supplying mixed gas

Provided is a means for fixing calcium phosphate onto the surface of a metal by a treatment method which uses no acid and produces less residue. A method of producing a calcium phosphate composite in which calcium phosphate is bonded to the surface of a base material, the method including a surface treatment step of bringing the surface of the base material into contact with a surface treating agent, and then into contact with a silane coupling agent, to surface treat the base material; a polymerization step of initiating, after the surface treatment step, polymerization of the silane coupling agent by means of a polymerization initiator; and a bonding step of bonding the silane coupling agent at the surface of the base material after the polymerization step, with calcium phosphate; wherein the base material is a metal, and the surface treating agent is ozone water.

Calcium phosphate complex, and method for production thereof

Provided is a method for treating the inner surface of a chlorine trifluoride supply passage that enables reliable prevention of the reduction in the concentration of ClFin a reaction chamber during process operation. The method includes: integrally connecting a gas supply passage () and a gas discharge passage () to a processing chamber () of a processing apparatus in which chlorine trifluoride is used as an etching gas; and applying chlorine trifluoride gas having a concentration equal to or higher than the concentration of chlorine trifluoride gas supplied during etching process operation on inner surfaces of at least the processing chamber () and the gas supply passage () among the processing chamber (), the gas supply passage (), and the gas discharge passage (), which are integrally formed, to coat the inner surfaces of at least the processing chamber () and the gas supply passage () with a fluoride film.

Method for treating inner surface of chlorine trifluoride supply passage in apparatus using chlorine trifluoride

The disclosed device and method produce high concentration ozonated water by connecting a high concentration ozone gas-supplying system that comprises an ozone gas-generating unit () for forming ozone gas, an ozone gas-concentrating unit () for concentrating the ozone gas formed, a concentrated ozone gas-pressurizing unit () for pressurizing the concentrated ozone gas output from the ozone gas-concentrating unit (), and a cooling mechanism () for cooling the concentrated ozone gas-pressurizing unit (), to an ozone gas-dissolving unit () to dissolve the high pressure, concentrated ozone gas in pure water and produce the high concentration ozonated water.

Method for producing high concentration ozonated water and device for producing high concentration ozonated water

A method of concentrating ozone gas including: causing ozone gas contained in ozone-oxygen mixture gas to be selectively adsorbed to adsorbents which are filled in a non-cooled state in at least two adsorbing cylinders arranged parallel to one another; desorbing the ozone gas from the adsorbents by subjecting a depressurizing process to each adsorbing cylinder during an ozone gas desorption operation; repeating an adsorption step and a desorption step alternately in the at least two adsorbing cylinders; and controlling the adsorbing cylinders, in such a way that one of the adsorbing cylinders is performing the adsorption step while another one of the adsorbing cylinders is performing the desorption step.

Method and apparatus for concentrating ozone gas

A method of the present invention for producing a calcium phosphate complex including a substrate and calcium phosphate bonded to a surface of the substrate, the method includes the steps of: (a) treating the surface of the substrate; and (b) bonding the calcium phosphate onto the surface of the substrate after the step (a), the step (a) being the step of placing the surface of the substrate in contact with ozone water. Therefore, the method of the present invention makes it possible to bond calcium phosphate and the substrate at a high bonding strength and at a high coverage. In addition, the method of the present invention provides an easy method for producing a calcium phosphate complex.

Method for producing calcium phosphate complex

A method for processing a sample using an electrically neutral reactive cluster is provided. The surface of a sample is processed by jetting out a mixed gas that is composed of a reactive gas and a gas with a boiling point lower than that of the reactive gas from a gas jetting part of a vacuum process room in which the sample is placed by a pressure in a range in which the mixed gas is not liquefied, in a predetermined direction, while adiabatically-expanding the mixed gas, thereby generating a reactive cluster and jetting the reactive cluster against the sample in the vacuum process room.

Cluster jet processing method, semiconductor element, microelectromechanical element, and optical component

A method of concentrating ozone gas in which, although the apparatus configuration is simple, ozone gas of a predetermined concentration can be efficiently taken out, and an apparatus therefor are provided. In a method of concentrating ozone gas in which an ozone-oxygen mixture gas is acted in an adsorbing column that is filled with an adsorbent, to cause the adsorbent to selectively adsorb the ozone gas, and the selectively adsorbed ozone gas is desorbed, thereby concentrating and purifying the ozone gas, the ozone-oxygen mixture gas is acted on the adsorbent in a non-cooled state to cause the ozone gas to be selectively adsorbed to the adsorbent, the adsorbing column is vacuumed when performing an operation desorbing of the ozone gas, thereby desorbing the ozone gas from the adsorbent, and an initial amount of the leading out of the desorbed ozone gas is not recovered, thereby obtaining high-concentration ozone gas.

Method of concentrating ozone gas and apparatus therefor

The present invention provides a method and an apparatus for condensing ozone arranged so as to efficiently take out the ozone gas of a predetermined concentration, although its construction is simple. The method for condensing the ozone gas comprises acting ozone-oxygen mixture gas on an adsorbing cylinder which is filled in its interior area with an adsorbent so as to selectively adsorb the ozone gas to an adsorbent and desorbing the selectively adsorbed ozone gas so as to condense and purify the ozone gas. The method further includes acting the ozone-oxygen mixture gas on the adsorbent in non-cooled state to selectively adsorb the ozone gas to the adsorbent and vacuuming the adsorbing cylinder on performing desorption-operation of the ozone gas to desorb the ozone gas from the adsorbent.

Method and apparatus for condensing ozone gas

A method for generating highly concentrated ozone gas by adsorbing ozone gas generated by an ozonizer with an absorbent within an adsorption column and then separating highly concentrated ozone gas from the adsorption column. Three adsorption columns are arranged in parallel. Each of the adsorption columns is controlled to repeat four steps of an ozone gas adsorbing step, a stabilizing and pressurizing step, an ozone gas desorbing step and a cooling down step. Each of the ozone gas adsorbing step and the ozone gas desorbing step has operation time set twice the operation time of each of the stabilizing and pressurizing step and the cooling down step. An ozone gas concentrating unit comprises three adsorption columns which are set to operate one after another by &frac13; cycle lag. Highly concentrated ozone gas separated at the desorbing step of each adsorption column is once stored in an ozone gas storage vessel.

Method for continuously generating highly concentrated ozone gas

A high-concentration ozone gas having a concentration of at least 50 VOL % of ozone in the ozone-oxygen system is acted within the temperature range of a normal temperature to 60.degree. C. on an ultrapurity-gas piping system for use in a semiconductor manufacturing apparatus and the like or on a metal component part for use in an ultrahigh-vacuum apparatus to form a passivation film on the interior metal surface thereof.

Process for passivating treatment of piping system for high-purity gas

Growing community of inventors

Moriyama, Japan

Kunihiko Koike