Fujifilm Corporation

Fuji Photo Film Company, Limited

Kabushiki Kaisha Toshiba

Kunihiko Kodama

Toshiaki Aoai

Kenichiro Sato

Kazuya Uenishi

Kaoru Iwato

Kenji Wada

Shinichi Kanna

Yuichiro Enomoto

Toru Fujimori

Shinji Tarutani

Fumiyuki Nishiyama

Kazuyoshi Mizutani

Yasumasa Kawabe

Hiromi Kanda

Kenichi Kodama

Kei Yamamoto

Tsukasa Yamanaka

Hyou Takahashi

Kyouhei Sakita

Hiroyuki Yonezawa

Akira Hikimura

Hideaki Tsubaki

Masaomi Makino

Shoichiro Yasunami

Tadashi Omatsu

Haruki Inabe

Hirotaka Kitagawa

Koji Shirakawa

Akinori Fujita

Makoto Momota

Tadashi Oomatsu

Hajime Nakao

Katsutoshi Moriyama

Naoya Sugimoto

Tomoe Nishimura

Takayuki Ito

Tomotaka Tsuchimura

Nobutaka Fukagawa

Kazuto Shimada

Kazuto Kunita

Takashi Inoue

Akiyoshi Goto

Tadahiro Sorori

Shinji Sakaguchi

Shiro Tan

Michio Ono

Daisuke Sasaki

Tomoya Sasaki

Toru Tsuchihashi

Yu Naito

Yuichiro Goto

Satoshi Wakamatsu

Yoshinori Kanazawa

Yutaka Adegawa

Hiroshi Saegusa

Jun Inagawa

Ikuo Kinoshita

Masahide Nagumo

Akihiro Hara

Kotaro Watanabe

Akiko Hattori

Hiroki Kuwahara

Yuko Yoshida

Kenichiro Satoh

Kazuyuki Usuki

Norihiko Taguchi

Hidekazu Ohashi

Provided are a resin composition including a compound represented by Formula (1) and a resin, a film and a filter including the resin composition, a liquid crystal display device and a solid-state imaging element including the filter, and a compound suitable as a light absorbing component of the resin composition and the filter. In Formula (1), Dye represents a colorant structural part obtained by removing n1 hydrogen atoms from a squarylium compound having a specific structure. Qis a structural part in which energy levels of a highest occupied molecular orbital and a lowest unoccupied molecular orbital satisfy a specific condition. Lrepresents a divalent linking group and n1 represents an integer of 1 to 4.

Resin composition, film, optical filter, image display device, solid-state imaging element, and compound

A non-aqueous liquid electrolyte for a secondary battery, containing an electrolyte and a compound (A) represented by any one of formulae (I-1) to (I-3) in an organic solvent: wherein Xrepresents an alkyl group substituted with a halogen atom; Yrepresents a hydrogen atom or an organic group; and ma represents an integer from 1 to 6; wherein Xrepresents a group having an oxygen atom; Yrepresents a hydrogen atom or an organic group; and mb represents an integer from 1 to 6; and wherein Yrepresents an organic group having 4 or more carbon atoms, or an organic group having an oxygen atom or a nitrogen atom; and mc represents an integer from 1 to 6.

Non-aqueous liquid electrolyte for secondary battery and secondary battery

An object of the present invention is to provide a lubricant composition having excellent lubrication properties in rigorous conditions such as a high temperature and/or a high pressure. The present invention relates to lubricant composition containing a condensate A which is obtained by condensing at least: an alkylene oxide adduct a1 of trihydric or more polyhydric alcohol formed by adding alkylene oxide to at least one hydroxyl group of the trihydric or more polyhydric alcohol; a divalent or more polyvalent carboxylic acid a2 or a precursor of the divalent or more polyvalent carboxylic acid a2; and at least one of a monovalent carboxylic acid a3, a precursor of the monovalent carboxylic acid a3, or monohydric alcohol a4.

Lubricant composition

A non-aqueous liquid electrolyte for a secondary battery, containing: a compound represented by formula (I); an electrolyte; and an organic solvent, in which the non-aqueous liquid electrolyte has a viscosity of 20 mPa&#xb7;s at 25&#xb0; C. or less, 

A non-aqueous liquid electrolyte for a secondary battery, containing: at least one selected from a carbonate compound having a halogen atom and a sulfur-containing ring compound; an aromatic ketone compound; an organic solvent; and an electrolyte salt, in which, with respect to 100 parts by mass of the organic solvent, the aromatic ketone compound is 0.001 to 10 parts by mass and the at least one selected from a carbonate compound having a halogen atom and a sulfur-containing ring compound is 0.001 to 10 parts by mass, and more than 50% by mass of the whole amount of the organic solvent is composed of a solvent with a melting point of 10&#xb0; C. or less.

Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A);

Curable composition for imprints, patterning method and pattern

A curable composition for imprints, containing (A1) a polymerizable compound having at least one of a fluorine atom and a silicon atom, (A2) a polymerizable compound having an aromatic group and (B) a photopolymerization initiator, exhibits good patternability in repeated pattern transferring and solvent resistance.

Provide is a curable composition for imprints, capable of effectively suppressing chipping of the cured pattern. A curable composition for imprints comprising (A) curable compound and (B) photo-polymerization initiator, having a moisture content ratio, relative to the total weight of all components excluding solvent, of less than 0.8% by weight.

Curable composition for imprints and method of storing the same

Provided is the pattern formability and line edge roughness of the resultant substrate. An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.8 or larger, and a molecular weight of 400 or larger:the Ohnishi parameter=(total number of atoms)/(number of carbon atoms&#x2212;number of oxygen atoms).&#x2003;&#x2003;(Equation 1)

Underlay film composition for imprints and method of forming pattern and pattern formation method using the same

Provide is a curable composition for imprints capable of keeping a good pattern and heat resistance. A curable composition for imprints comprising a polymerizable compound (Ax-1) having maleimide structure(s), or a compound (Ax-2) having a partial structure represented by formula (I) below. Formula (I) 

Curable composition for imprints, pattern-forming method and pattern

Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.

Curable composition for imprints, cured product and method for manufacturing a cured product

A curable composition for imprints which comprises a polymerizable compound having at least one of a fluorine atom and a silicon atom, a photopolymerization initiator, and a compound having a functional group capable of bonding to a substrate exhibits good patternability in transferring patterns, particularly micropatterns.

A positive photosensitive composition includes: a resin (A) whose dissolution rate in an alkaline developing solution increases by the action of an acid, the resin (A) containing an acid decomposable repeating unit represented by a general formula (I) and an acid nondecomposable repeating unit represented by a general formula (II); and a compound (B) capable of generating an acid upon irradiation with one of active rays and radiations: wherein Xarepresents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, Arepresents one of a single bond and a divalent connecting group, ALG represents an acid leaving hydrocarbon group, Xarepresents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, Arepresents one of a single bond and a divalent connecting group, and ACG represents an acid nonleaving hydrocarbon group.

Positive photosensitive composition and method of forming pattern using the same

Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising at least one kind of polymerizable monomer selected from the following compounds and a photopolymerization initiator; 

A composition for imprints comprising a polymerizable monomer, a photopolymerization initiator, and a polymer having a functional group with at least one of a fluorine atom or a silicon atom and having a polymerizable functional group, wherein the polymer has a weight-average molecular weight of at least 2000 and the amount of the polymer is from 0.01 to 20% by mass relative to the polymerizable monomer, is excellent in patternability and mold releasability, capable of forming good patterns and free from a problem of mold contamination.

Composition for imprints, pattern and patterning method

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Shizuoka, Japan

Kunihiko Kodama