Canon Kabushiki Kaisha

Kunihiko Asada

Tsuyoshi Arai

Tomohiro Harayama

Shingo Ishida

Kenta Sasa

Yoshihiro Koura

A display control method includes determining whether control information for controlling an arrangement of an imprint material with respect to a shot region of a substrate conforms to a rule, and displaying, on a display, the determination result together with shot region information indicating the shot region.

Display control method, editing support method and information processing apparatus

A method of controlling an imprint process to form a pattern by using a mold on a substrate is provided. The method includes inspecting to determine whether to continue or stop a series of imprint processes during the series of imprint processes of a lot, wherein the inspecting includes capturing an image of the pattern formed on a shot region by the imprint process, obtaining, by comparing a position of a peripheral portion of the pattern in the image and a design value of the position of the peripheral portion, an extrusion amount of an imprint material from the shot region due to the imprint process, and determining, based on a change in the extrusion amount over a plurality of imprint processes, a next process to transition from a current process upon stopping the series of imprint processes.

Method of controlling imprint apparatus, imprint apparatus, and method of manufacturing article

Imprint apparatus brings pattern region of mold into contact with imprint material on shot region of substrate, aligns the shot region and the pattern region with each other, and cures the imprint material. The apparatus includes light irradiator which irradiates the imprint material with light. In state that the imprint material on the shot region and the pattern region are in contact and the pattern region is flat, the light irradiator performs preliminary exposure of irradiating the imprint material with the light to increase viscosity of the imprint material. In the preliminary exposure, the light irradiator irradiates the imprint material with the light under illuminance distribution determined such that illuminance in contact beginning region where the imprint material and the pattern region begin to contact is lower than illuminance in certain region different from the contact beginning region.

Imprint apparatus and article manufacturing method

An adjusting method for adjusting an imprint apparatus includes a preparation step of preparing a sample for evaluating a state in which a contact region of a test mold is in contact with an imprint material supplied on a substrate; an evaluation step of evaluating the sample; and an adjustment step of adjusting the imprint apparatus based on a result of evaluation obtained in the evaluation step. The contact region includes a flat region which does not include a pattern, the evaluation in the evaluation step includes a first evaluation, which is an evaluation of a state of the imprint material in the flat region, and the imprint apparatus is adjusted based on a result of the first evaluation in the adjustment step.

Adjusting method for imprint apparatus, imprinting method, and article manufacturing method

Provided is a coating apparatus that includes: a discharge unit that discharges a liquid on an object; a measurement unit that is able to be disposed at a position facing a discharge surface of the discharge unit and measures a height position of the discharge surface using the facing position as a reference position; and a controller that calculates a thickness of an attached substance containing a material of the liquid attached to the discharge surface based on the height position measured by the measurement unit and determines implementation of a maintenance treatment based on the calculated thickness of the attached substance.

Coating apparatus, imprint apparatus, and method of manufacturing article

The present invention provides an imprint apparatus including a chamber configured to define a first space including a processing unit which includes a discharge unit configured to discharge an imprint material onto a substrate and is configured to perform an imprint process of forming a pattern of the imprint material on the substrate by using a mold, and an enclosure configured to define a second space including a tank configured to store the imprint material supplied to the discharge unit, wherein the tank has a first opening open to the second space, and the enclosure has a supply port configured to supply, to the second space via the first opening, a gas cleaner than a gas supplied to the first space.

Growing community of inventors

Utsunomiya, Japan

Kunihiko Asada