Showa Denko K.k.

Kuniaki Miyahara

Kenichi Sano

Shoichiro Wakabayashi

Toshiro Suzuki

Fujimaro Ogata

Tsutomu Sugiyama

Masaaki Nishiyama

A composition for removing side wall which includes an aqueous solution containing both nitric acid and at least one of carboxylic acids selected from the group consisting of polycarboxylic acid, aminocarboxylic acid, and salts thereof; a method of removing side wall; and a process for producing a semiconductor device. Use of the composition is effective in removing side wall at a low temperature in a short time in semiconductor device production without corroding the wiring material, e.g., an aluminium alloy. Thus, a semiconductor device having an aluminium alloy wiring which has undergone substantially no corrosion can be efficiently produced.

Composition for removing side wall and method of removing side wall

A lower fatty acid ester such as ethyl acetate or ethyl acrylate is prepared by a process in which a lower fatty acid such as acetic acid or acrylic acid is reacted with a lower olefin such as ethylene by using as solid catalyst a heteropoly-acid or its salt. The esterification is carried out in gaseous phase.

Process for preparation of lower fatty acid ester

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Yamaguchi, Japan

Kuniaki Miyahara