Visual Photonics Epitaxy Co., Ltd.

Kun Hsin Technology Inc.

Elite Advanced Laser Corporation

Kun-Chuan Lin

Jin-Hsiang Liu

Lung-Chien Chen

Yu-Chung Chin

Chao-Hsing Huang

Dong-Sing Wuu

Ray-Hua Horng

Sun-Chin Wei

Hui-Heng Wang

Man-Fang Huang

Kuo-Hsiung Chang

Min-Nan Tseng

Huai-Tung Yang

Shih-Jane Tsai

Yu-Lin Hsiao

Wei-Chou Wang

A nitride semiconductor structure includes a substrate, a nitride semiconductor layer, and a buffer stack layer between the substrate and the nitride semiconductor layer. The buffer stack layer includes a plurality of metal nitride multilayers repeatedly stacked, wherein each of the metal nitride multilayers consists of a first, a second, and a third metal nitride thin films in sequence, or consists of the first, the third, the second, and the third metal nitride thin films in sequence. The aluminum concentration of the first metal nitride thin film is higher than that of the third metal nitride thin film, and the aluminum concentration of the third metal nitride thin film is higher than that of the second metal nitride thin film.

Nitride semiconductor structure

A light-emitting module includes: (a) a liquid-crystal module containing a pair of transparent substrates and a liquid-crystal layer disposed between the pair of transparent substrates; (b) a first light-emitting diode (LED) component disposed on a first side of the liquid-crystal module; (c) a first transparent cover plate over the first LED component such that the first LED component is sandwiched between the liquid-crystal module and the first transparent cover plate; and (d) a control circuit configured to control an on/off frequency of the liquid-crystal module and a light-emitting frequency of the first LED component in such a manner that the light emitted from the first LED component is synchronously shielded by the liquid-crystal module, wherein the light is emitted from a side opposite to the liquid-crystal module.

Light-emitting modules and lighting modules

An embodiment of the present invention provides a light emitting device including: a transparent substrate; a wiring layer disposed on the transparent substrate; a plurality of light emitting diode chips disposed on the transparent substrate and electrically connected to the wiring layer; and an opposite substrate disposed on the transparent substrate to sandwich the light emitting diode chips and the wiring layer, wherein no wiring layer is disposed on a surface of the opposite substrate facing the light emitting diode chips.

LED light sheet

The invention provides a BiFET semiconductor device vertically integrating a FET and a HBT on the same substrate. The BiFET semiconductor device comprises a HBT structure, a high-resistivity structure, and a FET structure, sequentially formed in this order from bottom to top on a semi-insulating substrate. The high-resistivity structure comprises at least two layers. A first layer is on top of the HBT structure to provide the required high resistivity, while the second layer having a high purity is on top of the first layer to prevent the doped impurity in the first layer to affect the upper FET structure.

BiFET semiconductor device having vertically integrated FET and HBT

A method for fabricating a high brightness LED structure is disclosed herein, which comprises at least the following steps. First, a first layered structure is provided by sequentially forming a light generating structure, a non-alloy ohmic contact layer, and a first metallic layer from bottom to top on a side of a first substrate. Then, a second layered structure comprising at least a second substrate is provided. Then, the two-layered structures are wafer-bonded together, with the top side of the second layered structure interfacing with the top side of said first layered structure. The first metallic layer functions as a reflective mirror, which is made of a pure metal or a metal nitride to achieve superior reflectivity, and whose reflective surface does not participate in the wafer-bonding process directly.

Fabrication method of high-brightness light emitting diode having reflective layer

An LED structure is disclosed herein, which comprises, sequentially arranged in the following order, a light generating structure, a non-alloy ohmic contact layer, a metallic layer, and a substrate. As a reflecting mirror, the metallic layer is made of a pure metal or a metal nitride for achieving superior reflectivity. The non-alloy ohmic contact layer is interposed between the metallic layer and the light generating structure so as to achieve the required ohmic contact. To prevent the metallic layer from intermixing with the non-alloy ohmic contact layer and to maintain the flatness of the reflective surface of the first metallic layer, an optional dielectric layer is interposed between the metallic layer and the non-alloy ohmic contact layer.

High-brightness light emitting diode having reflective layer

A material made by arranging layers of gallium-arsenide-antimonide (GaAsSb, 0.0&#x2266;x&#x2266;1.0) and/or indium-gallium-arsenic-nitride (InGaAsN, 0.0&#x2266;y, z&#x2266;1.0) in a specific order is used to form the transistor base of a heterojunction bipolar transistor. By controlling the compositions of the materials indium-gallium-arsenic-nitride and gallium-arsenide-antimonide, and by changing the thickness and order of the layers, the new material would possess a specific energy gap, which in turn determines the base-emitter turn-on voltage of the heterojunction bipolar transistor.

Heterojunction bipolar transistor structure

A method of manufacturing a light emitting diode (LED) includes growing a light emitting region on a temporary substrate, bonding a metal-coated reflective permanent substrate and then removing the temporary substrate. The reflective metal layer also serves as a bonding agent for bonding the permanent substrate. The bonded LED element and permanent substrate are heated in a wafer bonding tool that includes a graphite lower chamber and a graphite upper cover with a stainless steel screw. Because of the different thermal expansion coefficients between stainless and graphite, the stainless steel screw applies a pressure to the bonded structure during the heating process to assist the bonding of the permanent substrate.

Light emitting diode with a metal-coated reflective permanent substrate and the method for manufacturing the same

A method of manufacturing a light emitting diode (LED) includes growing a light emitting region on a temporary substrate, bonding a transparent substrate of glass or quartz to the light emitting region and then removing the temporary substrate. A metal bonding agent also serving as an ohmic contact layer with LED is used to bond the transparent substrate to form a dual substrate LED element which is then heated in a wafer holding device that includes a graphite lower chamber and a graphite upper cover with a stainless steel screw. Because of the different thermal expansion coefficients between stainless and graphite, the stainless steel screw applies a pressure to the dual substrate LED element during the heating process to assist the bonding of the transparent substrate.

Light emitting diode with a permanent subtrate of transparent glass or quartz and the method for manufacturing the same

A light emitting diode includes a double hetero structure containing an upper cladding layer with a graded composition. The light emitting diode comprises a GaAs substrate, a first ohmic contact to the substrate, an AlGaInP lower cladding layer formed on the GaAs substrate, an AlGaInP active layer formed on the lower cladding layer, an AlGaInP upper cladding layer formed on the active layer and a second ohmic contact. The AlGaInP upper cladding layer has a graded composition which increases the LED brightness and decreases the forward bias voltage of the light emitting diode. The graded composition can also be used in the upper semiconducting layer of a conventional p-n junction light emitting diode.

Light-emitting diode having a layer of AlGaInP graded composition

A light-emitting diode having a transparent substrate contains a transparent GaP substrate having a first lattice constant, a first ohmic contact to the GaP substrate, a buffer layer having a graded lattice constant which gradually changes from a first lattice constant to a second lattice constant, a light generating region formed on the buffer layer and having the second lattice constant, and a second ohmic contact formed on the light generating region. In the present invention, light emitted to the substrate is not absorbed by the transparent substrate. Therefore, the brightness of the LED is increased and the V.sub.f value is not increased.

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Taipei, Taiwan

Kun-Chuan Lin