Taiwan Semiconductor Manufacturing Comp. Ltd.

Kun-Chih Lee

Shih-Chang Chen

Ming-Fang Wang

Ming-Ho Yang

Karen Mai

Yu Min Lin

Liang-Gi Yo

A method for fabricating a portion of an integrated circuit on a semiconductor substrate. The method includes cleaning the surface of the substrate, and forming a thin insulate over the substrate. The method also includes depositing a high dielectric constant (high-k) material over the thin insulate, and then performing a hydrogen-based anneal on the high-k material. The method further includes performing an oxygen-based anneal on the high-k material, wherein the hydrogen-based and oxygen-based anneals occur sequentially.

Growing community of inventors

Sinhua, Taiwan

Kun-Chih Lee