Shin-Etsu Chemical Co., Ltd.

Kumiko Hayashi

Hideto Kato

Michihiro Sugo

Kazunori Kondo

Hitoshi Maruyama

Akira Uta

Tomoki Akiba

A photosensitive resin composition comprising (A) a silicone skeleton-containing polymer, (B) a photoacid generator, and (C) a peroxide is coated to form a photosensitive resin coating which is unsusceptible to plastic deformation while maintaining flexibility. A pattern forming process using the composition is also provided.

Photosensitive resin composition, laminate, and pattern forming process

A photosensitive resin composition comprising an isocyanurate-modified silicone resin containing an epoxy group in the molecule is easy to form a resin coating which has high transparency, light resistance and heat resistance, is amenable to micro-processing, and is useful in applications for protecting and encapsulating optical devices. The coating can be processed in thick film form to define a pattern having a fine size and perpendicularity, and becomes a cured coating which has improved adhesion to substrates, electronic parts, semiconductor devices, and supports for circuit boards, mechanical properties, electric insulation, and crack resistance, and is reliable as an insulating protective film.

Epoxy-containing, isocyanurate-modified silicone resin, photosensitive resin composition, photosensitive dry film, laminate, and pattern forming process

Provided is a thermoplastic elastomer comprising a mesogen-silicon compound (co)polymer which is represented by formula (1) below and has a number average molecular weight of 1,000-500,000. The thermoplastic elastomer has transparency and rubber properties (rubber elasticity) and can be (repeatedly) molded thermally and reversibly, and thus can be suitably used in potting materials or various sealing materials. In formula (1), Ar represents a mesogenic group selected from among structures represented by formula (2) below, a represents an integer of 0.5-1, b represents a number of 0-0.5 (a and b respectively represent the ratio of the number of respective repeating units to the sum of all the repeating units in the molecule, and a+b=1), Ris a monovalent hydrocarbon group that does not contain a C1-8 aliphatic unsaturated bond, and Ris a hydrogen atom, &#x2014;Si(CH), &#x2014;Si(CH)(OH), &#x2014;Si(CH)(CH&#x2550;CH) or &#x2014;Si(CH)(CH&#x2014;CH&#x2550;CH). 

Growing community of inventors

Annaka, Japan

Kumiko Hayashi