Sri International

Kuldip Bhasin

Subhash C Narang

Sunity Kumar Sharma

Asutosh Nigam

Madan Lal Sharma

Durga Annavajjula

Methods and apparatus are provided in which a metal precursor is formed in a process that includes the following steps: depositing a metal precursor on a substrate; adding an energy to reduce the metal precursor and to precipitate metal on the substrate as a continuous metal layer; and selecting the metal precursor and the energy such that the purity of the continuous metal layer is greater than 85%, and/or the deposited layer has an electrical conductivity substantially that of a pure metal. Methods and apparatus are also provided in which a metal is deposited onto a substrate by a process which includes the following steps: depositing the metal precursor onto the substrate in a desired pattern; and applying sufficient energy to decompose the precursor to precipitate metal in a continuous metal layer in the desired pattern.

Method of producing and depositing a metal film

Methods and apparatus are provided in which a coating is deposited onto a substrate by a process which includes the following steps: depositing a precursor onto the substrate in a desired pattern; depositing an appropriate ligand onto the substrate; and applying sufficient energy to transfer electrons from the ligand to the precursor, thereby decomposing the precursor to form a precipitate. In one aspect of preferred embodiments, the precursor comprises a metallic salt, and the precipitate comprises a metal. Especially preferred salts are carboxylates, halides, nitrates, and pseudo halides. In another aspect of preferred embodiments, the ligand comprises an amine, an amide, a phosphine, a sulfide, or any other ligand containing nitrogen, phosphorous, sulphur or other donor atoms. In another aspect of preferred embodiments, the energy is supplied at least partially as radiant heat. In another aspect of the preferred embodiments, the deposited material has a high purity of at least 80% by weight, a desired pattern is produced without removing from the substrate a substantial quantity of either the precursor or the deposited coating.

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Chandigar, India

Kuldip Bhasin